(3-Hydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone | 105443-53-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: (3-Hydroxyphenyl)-(2,3,4-trihydroxyphenyl)methanone
• CAS: 105443-53-6
• 化学式: C₁₃H₁₀O₅
• 分子量: 246.21
• InChiKey: HWZREQONUGCFIT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  18
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  98
• 氢给体数：
  4
• 氢受体数：
  5

文献信息

• Styryl compounds, process for preparing the same and photoresist compositions comprising the same
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：EP0323631A2

  公开（公告）日：1989-07-12

  A styryl compound of the formula: wherein R₁, R₂ and R₁₁ are the same or different and a hydrogen atom, an optionally substituted alkyl, alkenyl or aralkyl group or R₁ and R₂ may form a ring together with the nitrogen atom to which they are bonded, which ring may inc­lude at least one hetero atom in addition to said nitrogen atom; R₁₀ is an optionally substituted alkylene group; R₃ is -OH, -OCOR₅ or -OSi(R₅)₃ in which R⁵ is an alkyl group; R₁₂ and R₁₃ are independently a hydrogen atom, an optionally substituted lower alkyl or alkoxy group, an amide group or a halogen atom; X, Y, W and Z are the same or different and an electron attracting group, and n is a number of 2-15, which is suitable as a light absorber in a photoresist composi­tion.

  式中的苯乙烯基化合物： 其中R₁、R₂和R₁₁是相同或不同的氢原子、任选取代的烷基、烯基或芳烷基，或者R₁和R₂可与它们所键合的氮原子一起形成一个环，该环除所述氮原子外还可包括至少一个杂原子；R₁₀是任选取代的亚烷基；R₃是-OH、-OCOR₅或-OSi(R₅)₃，其中 R⁵ 是烷基；R₁₂和 R₁₃ 独立地是氢原子、任选取代的低级烷基或烷氧基、酰胺基或卤素原子；X、Y、W 和 Z 是相同或不同的引电子基团，n 是 2-15 之间的数字，适合用作光刻胶组合物中的光吸收剂。
• Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：EP0341608A2

  公开（公告）日：1989-11-15

  A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I): wherein Y₁, Y₂, Y₃ and Y₄ are the same or different and each a hydrogen atom, an alkyl group, a halogen atom or a hydro­xyl group, provided that at least one of Y₁, Y₂, Y₃ and Y₄ is a hydroxyl group; Z₁, Z₂, Z₃, Z₄, Z₅ and Z₆ are the same or different and each a hydrogen atom, an alkyl, an aryl group, a halogen atom or a hydroxyl group, provided that at least one of Z₁, Z₂, Z₃, Z₄, Z₅ and Z₆ is a hydroxyl group; X is in which R₁ and R₂ are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cyclo­alkyl group, an alkoxy group or an aryl group, provided that when at least one of R₁ and R₂ is a hydrogen atom, an alkyl or aryl group is present at the ortho position to a hydroxyl group which is present at the ortho position to X provides a positive resist composition which has a high γ-value.

  一种通式为(I)的苯酚化合物的醌重氮磺酸酯： 其中 Y₁、Y₂、Y₃ 和 Y₄ 相同或不同，且各自为氢原子、烷基、卤素原子或羟基，条件是 Y₁、Y₂、Y₃ 和 Y₄ 中至少有一个是羟基；Z₁、Z₂、Z₃、Z₄、Z₅ 和 Z₆ 相同或不同，且各自为氢原子、烷基、芳基、卤素原子或羟基，条件是 Z₁、Z₂、Z₃、Z₄、Z₅ 和 Z₆ 中至少有一个是羟基；X 是 其中，R₁ 和 R₂ 可以相同或不同，并且各自为氢原子、烷基、烯基、环烷基、烷氧基或芳基，条件是当 R₁ 和 R₂ 中至少有一个是氢原子、烷基或芳基时，在与羟基的正交位置上存在羟基，而羟基在与 X 的正交位置上存在时，可提供具有高 γ 值的正抗蚀剂组合物。
• Radiation-sensitive positive resist composition
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：EP0461654A2

  公开（公告）日：1991-12-18

  A positive resist composition comprising a radiation-sensitive component, an alkali-soluble resin and a phenol compound of the formula: wherein R is a hydrogen atom, a lower alkyl group or a phenyl group, R' is an alkyl group or an alkoxy group, and n is a number of 0 to 3, which has well balanced good properties such as sensitivity, resolution, heat resistance and adhesiveness.

  一种阳离子抗蚀剂组合物，由辐射敏感成分、碱溶性树脂和式中的苯酚化合物组成： 其中 R 是氢原子、低级烷基或苯基，R'是烷基或烷氧基，n 是 0 至 3 的数字，它具有良好的平衡特性，如敏感性、分辨率、耐热性和粘合性。
• Process for preparing radiation sensitive compound and positive resist composition
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：EP0509431A1

  公开（公告）日：1992-10-21

  A radiation sensitive compound prepared by reacting a phenol compound with a quinone diazide sulfonyl halide in a mixture of a solvent having a relative dielectric constant of not larger than 10 and a solvent having a relative dielectric constant of at least 15, which compound is less colored and gives a positive resist composition having a good resolution.

  在相对介电常数不大于 10 的溶剂和相对介电常数至少为 15 的溶剂的混合物中，使苯酚化合物与醌重氮磺酰卤反应而制备的辐射敏感性化合物，该化合物着色较少，可得到具有良好分辨率的正抗蚀剂组合物。
• Photoresist compositions comprising styryl compounds
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：EP0510726A1

  公开（公告）日：1992-10-28

  A photoresist composition which comprises a compound of the general formula: wherein W and Z are the same or different and an electron attractive group; R₁₀ is an optionally substituted C₁-C₁₀ alkylene group, R₁₁ is a hydrogen atom, an optionally substituted C₁-C₁₀ alkyl, alkenyl or aralkyl group; and each of R₁₂ and R₁₃ is independently a hydrogen atom, an optionally substituted lower alkyl group, an optionally substituted lower alkoxy group, an amide group or a halogen atom.

  一种光致抗蚀剂组合物，由通式如下的化合物组成： 其中 W 和 Z 是相同或不同的引电子基团；R₁₀ 是任选取代的 C₁-C₁₀ 亚烷基，R₁₁ 是氢原子、任选取代的 C₁-C₁₀ 烷基、烯基或芳基；R₁₂ 和 R₁₃ 中的每一个独立地为氢原子、任选取代的低级烷基、任选取代的低级烷氧基、酰胺基或卤原子。