1,1,2,2-Tetrafluorooctane

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 有机氟化物
• 英文名称: 1,1,2,2-Tetrafluorooctane
• 化学式: C₈H₁₄F₄
• 分子量: 186.19
• InChiKey: MSKBHWCDSAQEAG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.6
• 重原子数：
  12
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor
  申请人：JSR Corporation

  公开号：EP1295924A2

  公开（公告）日：2003-03-26

  A stacked film, a method for the production of the stacked film, an insulating film comprising the stacked film, and a substrate for semiconductor, using the insulating film. The stacked film comprises films of two or more kinds of alkoxysilane hydrolysis condensates having 5 nm or more difference in a mean radius of gyration, or films of alkoxysilane hydrolysis condensate having 0.3 or more difference in the dielectric constant. The stacked film is obtained by applying a coating solution comprising (B) a compound having a mean radius of gyration of less than 10 nm, and then applying a coating solution comprising (A) a compound having a mean radius of gyration of from 10 to 30 nm, followed by heating. The stacked film provides a dielectric film (substrate for semiconductor) having superior adhesion to a CVD film.

  一种叠层薄膜、一种生产叠层薄膜的方法、一种由叠层薄膜构成的绝缘薄膜，以及一种使用该绝缘薄膜的半导体衬底。叠层薄膜包括两种或两种以上平均回转半径相差 5 nm 或更多的烷氧基硅烷水解缩合物薄膜，或介电常数相差 0.3 或更多的烷氧基硅烷水解缩合物薄膜。叠层薄膜的获得方法是先涂覆平均回转半径小于 10 纳米的化合物（B），再涂覆平均回转半径为 10 至 30 纳米的化合物（A），然后加热。叠层薄膜可提供与 CVD 薄膜具有优异附着力的电介质薄膜（半导体衬底）。
• POLYMER AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR FORMING INSULATING FILM, AND INSULATING FILM AND METHOD OF FORMING THE SAME
  申请人：JSR Corporation

  公开号：EP1719793A1

  公开（公告）日：2006-11-08

  A process for producing a polymer according to the invention includes mixing (A) a polysiloxane compound and (B) a polycarbosilane compound in the presence of a catalyst, water, and an organic solvent, and heating the mixture.

  根据本发明生产聚合物的工艺包括：在催化剂、水和有机溶剂存在下，混合(A) 聚硅氧烷化合物和(B) 聚碳硅烷化合物，并加热混合物。
• ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE
  申请人：JSR Corporation

  公开号：EP1981074A1

  公开（公告）日：2008-10-15

  An insulating-film-forming composition for a semiconductor device comprising an organic silica sol with a carbon atom content of 11 to 17 atom % and an organic solvent is disclosed. The organic silica sol comprises a hydrolysis-condensation product P1 and a hydrolysis-condensation product P2. The hydrolysis-condensation product P1 is obtained by hydrolyzing and condensing (A) a silane monomer comprising a hydrolyzable group and (B) a polycarbosilane comprising a hydrolyzable group in the presence of (C) a basic catalyst, and the hydrolysis-condensation product P2 is obtained by hydrolyzing and condensing (D) a silane monomer comprising a hydrolyzable group.

  本发明公开了一种用于半导体器件的绝缘成膜组合物，该组合物由碳原子含量为 11 至 17 原子%的有机硅溶胶和有机溶剂组成。有机硅溶胶包括水解缩合产物 P1 和水解缩合产物 P2。水解缩合产物 P1 是在 (C) 碱性催化剂存在下，通过水解和缩合 (A) 包含可水解基团的硅烷单体和 (B) 包含可水解基团的聚碳硅烷而得到的，水解缩合产物 P2 是通过水解和缩合 (D) 包含可水解基团的硅烷单体而得到的。
• Negative-type photosensitive resin composition, cured film, element and display apparatus that include cured film, production method for the same
  申请人：TORAY INDUSTRIES, INC.

  公开号：US10802401B2

  公开（公告）日：2020-10-13

  To provide an alkaline developable negative-type photosensitive resin composition from which a cured film that has a high-resolution and low-taper pattern shape and that are excellent in heat resistance and light blocking property can be obtained. A negative-type photosensitive resin composition is characterized by containing an (A1) first resin, a (A2) second resin, a (C) photopolymerization initiator, and a (D) coloring agent, wherein the (A1) first resin is an (A1-1) polyimide and/or an (A1-2) polybenzo-oxazole, and wherein the (A2) second resin is one or more species selected from a (A2-1) polyimide precursor, a (A2-2) polybenzo-oxazole precursor, a (A2-3) polysiloxane, a (A2-4) cardo based resin, and an (A2-5) acrylic resin, and wherein a content ratio of the (A1) first resin in a total of 100 mass % of the (A1) first resin and the (A2) second resin is within the range of 25 to 90 mass %.

  提供一种可碱性显影的底片型感光树脂组合物，通过该组合物可以获得具有高分辨率和低锥形图案形状的固化胶片，并且该胶片具有优异的耐热性和遮光性。阴图型感光树脂组合物的特点是含有 (A1) 第一树脂、(A2) 第二树脂、(C) 光聚合引发剂和 (D) 着色剂，其中 (A1) 第一树脂是 (A1-1) 聚酰亚胺和/或 (A1-2) 聚苯并噁唑，(A2) 第二树脂是选自 (A2-1) 聚酰亚胺前体、(A2-2) 聚苯并噁唑、(A2-3) 聚苯并噁唑、(A2-4) 聚苯并噁唑、(A2-5) 聚苯并噁唑和(A2-6) 聚苯并噁唑的一种或多种、(A2-2)聚苯并恶唑前体、(A2-3)聚硅氧烷、(A2-4)卡多基树脂和(A2-5)丙烯酸树脂中的一种或多种，其中(A1)第一树脂在(A1)第一树脂和(A2)第二树脂总质量的 100%中的含量比在 25 至 90 质量%的范围内。
• Composition for film formation, method of film formation, and silica-based film
  申请人：JSR Corporation

  公开号：EP1127929B1

  公开（公告）日：2009-04-15