Provided is a compound that can be used as a base resin for a photosensitive resin composition. The photosensitive resin can form a fine pattern and can achieve high resolution without impairing mechanical strength and solubility. The compound is represented by the general formula (1):
wherein Z represents a linear, branched or cyclic divalent hydrocarbon group having 2 to 30 carbon atoms; X
1
to X
3
represent any of —CO
2
—, —CONR
X1
—, —O—, —NR
X1
—, —S—, —SO
2
—, —SO
3
— and —SO
2
NR
X1
— and may be the same as or different from each other, provided that R
X1
is a hydrogen atom or a monovalent hydrocarbon group having 1 to 30 carbon atoms; Ar represents a divalent aromatic group having 2 to 30 carbon atoms; L
1
and L
2
independently represent a divalent hydrocarbon group having 1 to 30 carbon atoms; and x and y are each independently 0 or 1.
提供的是一种可以用作光敏
树脂组合物的基
树脂的化合物。这种光敏
树脂可以形成精细图案,并且可以在不影响机械强度和溶解性的情况下实现高分辨率。该化合物由通式(1)表示:其中Z代表具有2到30个碳原子的线性、支链或环状二价碳氢基团;X1到X3代表任何一种—
CO2—、—CONRX1—、—O—、—NRX1—、—S—、—SO2—、—SO3—和—SO2NRX1—中的一种,并且它们可以相同也可以不同,只要RX1是氢原子或具有1到30个碳原子的一价碳氢基团;Ar代表具有2到30个碳原子的二价芳香基团;L1和
L2分别代表具有1到30个碳原子的二价碳氢基团;x和y分别独立地为0或1。