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5'-O-(2-(4-chloro-2-nitrophenyl)ethoxycarbonyl)thymidine | 179691-41-9

中文名称
——
中文别名
——
英文名称
5'-O-(2-(4-chloro-2-nitrophenyl)ethoxycarbonyl)thymidine
英文别名
2-(4-chloro-2-nitrophenyl)ethyl [(2R,3S,5R)-3-hydroxy-5-(5-methyl-2,4-dioxopyrimidin-1-yl)oxolan-2-yl]methyl carbonate
5'-O-(2-(4-chloro-2-nitrophenyl)ethoxycarbonyl)thymidine化学式
CAS
179691-41-9
化学式
C19H20ClN3O9
mdl
——
分子量
469.835
InChiKey
ITXYODHUXUSPMS-ARFHVFGLSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    1.7
  • 重原子数:
    32
  • 可旋转键数:
    8
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.42
  • 拓扑面积:
    160
  • 氢给体数:
    2
  • 氢受体数:
    9

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为产物:
    参考文献:
    名称:
    New Photolabile Protecting Groups in Nucleoside and Nucleotide Chemistry—Synthesis, Cleavage Mechanisms and Applications
    摘要:
    New photolabile protecting groups have been found in the 2-(2-nitrophenyl)ethoxycarbonyl and the 2-(2-nitrophenyl)ethylsulfonyl group, respectively. The influence of substituents at the phenyl ring as well as the side-chain has been investigated regarding the photolysis rates on irradiation at 365 mn. beta-Branching in the side-chain leads to highly increased rates of photodeprotection. A new type of photocleavage mechanism consisting of a photoinduced beta-elimination process is proposed.
    DOI:
    10.1080/07328319808004738
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文献信息

  • Nucleoside derivatives with photolabile protective groups
    申请人:Pfleiderer; Wolfgang
    公开号:US05763599A1
    公开(公告)日:1998-06-09
    The invention relates to nucleoside derivatives having photolabile protective groups of the general formula (I) ##STR1## in which R.sup.1 .dbd.H, NO.sub.2, CN, OCH.sub.3, halogen or alkyl or alkoxyalkyl having 1 to 4 C atoms R.sup.2 .dbd.H, OCH.sub.3 R.sup.3 .dbd.H, F, Cl, Br, NO.sub.2 R.sup.4 .dbd.H, halogen, OCH.sub.3, or an alkyl radical having 1 to 4 C atoms R.sup.5 .dbd.H or a usual functional group for preparing oligonucleotides R.sup.6 .dbd.H, OH, halogen or XR.sup.8, where X.dbd.O or S and R.sup.8 represents a protective group usual in nucleotide chemistry, B=adenine, cytosine, guanine, thymine, uracil, 2,6-diaminopurin-9-yl, hypoxanthin-9-yl, 5-methylcytosin-1-yl, 5-amino-4-imidazolcarboxamid-1-yl, or 5-amino-4-imidazolcarboxamid-3-yl, where in the case of B=adenine, cytosine or guanine, the primary amino function optionally exhibits a permanent protective group. These derivatives may be used for the light-controlled synthesis of oligonucleotides on a DNA chip.
    本发明涉及具有光敏保护基的核苷酸衍生物,其通式为(I): 其中,R1 = H、NO2、CN、OCH3、卤素或具有1至4个碳原子的烷基或烷氧基烷基;R2 = H、OCH3;R3 = H、F、Cl、Br、NO2;R4 = H、卤素、OCH3或具有1至4个碳原子的烷基基团;R5 = H或用于制备寡核苷酸的常见官能团;R6 = H、OH、卤素或XR8,其中X = O或S,R8代表核苷酸化学中常见的保护基;B = 腺嘌呤、胞嘧啶、鸟嘌呤、胸腺嘧啶、尿嘧啶、2,6-二氨基嘌呤-9-基、次黄嘌呤-9-基、5-甲基胞嘧啶-1-基、5-氨基-4-咪唑羧酰胺-1-基或5-氨基-4-咪唑羧酰胺-3-基,其中在B = 腺嘌呤、胞嘧啶或鸟嘌呤的情况下,原始氨基功能可以选择性地具有永久保护基。这些衍生物可用于在DNA芯片上进行光控制合成寡核苷酸。
  • NUCLEOSID-DERIVATE MIT PHOTOLABILEN SCHUTZGRUPPEN
    申请人:Pfleiderer, Wolfgang
    公开号:EP0797580B1
    公开(公告)日:2002-04-10
  • US5763599A
    申请人:——
    公开号:US5763599A
    公开(公告)日:1998-06-09
  • New Photolabile Protecting Groups in Nucleoside and Nucleotide Chemistry—Synthesis, Cleavage Mechanisms and Applications
    作者:H. Giegrich、S. Eisele-Bühler、Chr Hermann、E. Kvasyuk、R. Charubala、W. Pfleiderer
    DOI:10.1080/07328319808004738
    日期:1998.9
    New photolabile protecting groups have been found in the 2-(2-nitrophenyl)ethoxycarbonyl and the 2-(2-nitrophenyl)ethylsulfonyl group, respectively. The influence of substituents at the phenyl ring as well as the side-chain has been investigated regarding the photolysis rates on irradiation at 365 mn. beta-Branching in the side-chain leads to highly increased rates of photodeprotection. A new type of photocleavage mechanism consisting of a photoinduced beta-elimination process is proposed.
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