[(E)-2-pentoxyethenyl]benzene

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: [(E)-2-pentoxyethenyl]benzene
• 化学式: C₁₃H₁₈O
• 分子量: 190.28
• InChiKey: OWRFOTFNTZSPSJ-ZRDIBKRKSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.1
• 重原子数：
  14
• 可旋转键数：
  6
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.38
• 拓扑面积：
  9.2
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• SULFONIUM SALT, RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160090355A1

  公开（公告）日：2016-03-31

  A sulfonium salt of formula (0-1) is provided wherein W is alkylene or arylene, R 01 is a monovalent hydrocarbon group, m is 0, 1 or 2, k is an integer: 0≦k≦5+4m, R 101 , R 102 and R 103 are a monovalent hydrocarbon group, or at least two of R 101 , R 102 and R 103 may bond together to form a ring with the sulfur atom, and L is a single bond, ester, sulfonic acid ester, carbonate or carbamate bond. A resist composition comprising the sulfonium salt as PAG exhibits a very high resolution when processed by EB and EUV lithography. A pattern with minimal LER is obtainable.

  提供一种化学式为（0-1）的磺鎓盐，其中W是烷基或芳基，R01是一价碳氢基团，m为0、1或2，k为整数：0≦k≦5+4m，R101、R102和R103是一价碳氢基团，或者R101、R102和R103中至少两个可以相互结合形成与硫原子的环，L是单键、酯、磺酸酯、碳酸酯或氨基甲酸酯键。包含磺鎓盐作为PAG的抗蚀组成物在经过电子束或极紫外光刻过程时表现出非常高的分辨率。可获得具有最小LER的图案。
• Polymer for photoresist, method of production thereof and photoresist composition containing polymer
  申请人：——

  公开号：US20020015906A1

  公开（公告）日：2002-02-07

  A polymer for a photoresist composition is given by the formula (I): 1 wherein R 1 is a hydrogen atom or a methyl group, R 2 is a C 1-12 linear or branched alkyl, haloalkyl or alkoxycarbonyl group, a C 5-12 cyclic alkyl, cyclic haloalkyl or cyclic alkoxycarbonyl group, a phenyl group or a naphthyl group, R 3 is a C 1-12 linear or branched alkyl or haloalkyl group, a C 5-12 cyclic alkyl or cyclic haloalkyl group, a phenyl group, or a naphthyl group, R 4 and R 5 are independently a hydrogen atom, a C 1-6 linear or branched alkyl, or a C 5-6 cyclic alkyl group, R′ and R″ are independently a hydrogen atom, a halogen atom, a C 1-8 alkyl or alkoxy group, a hydroxy group, a carbonate group or a phenyl group, and m, n, p and q are independently an integer provided that m and q are not zero, at least one of n and p are not zero, 0.4≦m/(m+n+p+q)≦0.9, 0≦n/(m+n+p+q)≦0.5, 0≦p/(m+n+p+q)≦0.5, and 0.01≦q/(m+n+p+q)≦0.3.

  给出了一种用于光阻组合物的聚合物，其化学式为（I）：其中R1是氢原子或甲基基团，R2是C1-12线性或支链烷基，卤代烷基或烷氧羰基基团，C5-12环烷基，环卤代烷基或环烷氧羰基基团，苯基或萘基，R3是C1-12线性或支链烷基或卤代烷基，C5-12环烷基或环卤代烷基，苯基或萘基，R4和R5分别是氢原子，C1-6线性或支链烷基或C5-6环烷基基团，R'和R"分别是氢原子，卤素原子，C1-8烷基或烷氧基团，羟基，碳酸酯基或苯基，m，n，p和q是整数，其中m和q不为零，n和p中至少有一个不为零，0.4≤m/(m+n+p+q)≤0.9，0≤n/(m+n+p+q)≤0.5，0≤p/(m+n+p+q)≤0.5，0.01≤q/(m+n+p+q)≤0.3。
• Resist composition and patterning process
  申请人：——

  公开号：US20030118934A1

  公开（公告）日：2003-06-26

  Resist compositions comprising as the base resin a polymer using tert-amyloxystyrene as a reactive group which is decomposable under the action of an acid to increase solubility in alkali have advantages including a significantly enhanced contrast of alkali dissolution rate before and after exposure, a high sensitivity, and a high resolution in the baking temperature range of 100-110° C. which is unachievable with tert-butoxystyrene. The compositions are best suited as a chemically amplified resist material for micropatterning in the manufacture of VLSI.

  抗蚀组合物包括以 tert-amyloxystyrene 作为反应基团的聚合物作为基础树脂，该基团在酸的作用下分解以增加在碱性溶液中的溶解度。这种组合物具有显着增强的碱溶解速率对比度，高灵敏度和高分辨率，适用于100-110°C的烘焙温度范围，而 tert-butoxystyrene 则无法实现。这些组合物最适合作为化学增强抗蚀材料用于微图案制造的VLSI。
• Two-component urethane coating system
  申请人：The Lubrizol Corporation

  公开号：EP0094196A2

  公开（公告）日：1983-11-16

  The present invention contemplates the provision of two-component urethane coating compositions comprising a first component comprising an organic polyfunctional isocyanate, and a second component comprising an acidic ester of a phosphoric acid, the alcohol portions of said acidic acid being selected from the group consisting of hydrocarbyloxy and hydroxysubstituted hydrocarbyloxy compounds, such compositions providing enhanced corrosion resistance properties as well as improved flame retardency and metal adhesion characteristics over the two-component urethane systems of the prior art. An essential ingredient in the compositions of the invention is a non-Newtonian colloidal disperse system which can be provided with either the first component and/or the second component parts of the compositions of the invention. The non-Newtonian colloidal disperse systems provided in accordance with the present invention comprise (1) solid metal-containing colloidal particles predispersed in (2) a disperse medium of at least one inert organic liquid and (3) as an essential third component at least one member selected from the class consisting of organic compounds which are substantially soluble in said disperse medium, the molecules of said organic compound being characterized by polar substituents and hydrophobic portions. The invention also relates to a method of coating a substrate comprising mixing the foregoing components and depositing the resulting composition on said substrate.

  本发明考虑提供双组分聚氨酯涂料组合物，其第一组分包括有机多官能团异氰酸酯，第二组分包括磷酸的酸性酯，所述酸性酸的醇部分选自烃比氧基和羟基取代烃比氧基化合物组成的组，与现有技术的双组分聚氨酯体系相比，这种组合物具有更强的耐腐蚀性能，以及更好的阻燃性和金属粘附性。本发明组合物中的一种重要成分是非牛顿胶体分散系统，它可以与本发明组合物的第一组分和/或第二组分一起提供。根据本发明提供的非牛顿胶体分散体系包括：(1) 预先分散在 (2) 至少一种惰性有机液体的分散介质中的含金属固体胶体颗粒；(3) 作为重要的第三组分，至少一种选自有机化合物类别的成员，这些有机化合物基本上可溶于所述分散介质，所述有机化合物的分子具有极性取代基和疏水部分。本发明还涉及一种涂覆基质的方法，包括混合上述组分并将所得组合物沉积在所述基质上。
• Linker and support for solid phase synthesis of nucleic acid
  申请人：Nitto Denko Corporation

  公开号：EP2357188A1

  公开（公告）日：2011-08-17

  Provided are a universal linker capable of synthesizing nucleic acid having a phosphate group at the 3' terminal, a universal support carrying the linker, and a synthesis method of nucleic acid using the universal support. A linker for solid phase synthesis of nucleic acid, containing a compound represented by at least one of the following formulae wherein each symbol is as defined in the specification, is provided.

  本发明提供了一种能够合成在 3'末端具有磷酸基团的核酸的通用连接体、一种携带该连接体的通用支持物以及一种使用该通用支持物的核酸合成方法。 一种用于固相合成核酸的连接剂，含有至少由下式之一代表的化合物 其中各符号如说明书中所定义。