[4-Hydroxy-3-(1,1,1-trifluoro-2-hydroxypropan-2-yl)phenyl] 2-methylprop-2-enoate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚酯
• 英文名称: [4-Hydroxy-3-(1,1,1-trifluoro-2-hydroxypropan-2-yl)phenyl] 2-methylprop-2-enoate
• 英文别名: [4-hydroxy-3-(1,1,1-trifluoro-2-hydroxypropan-2-yl)phenyl] 2-methylprop-2-enoate
• 化学式: C₁₃H₁₃F₃O₄
• 分子量: 290.23
• InChiKey: IULHRTXPDJDCQB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.3
• 重原子数：
  20
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.31
• 拓扑面积：
  66.8
• 氢给体数：
  2
• 氢受体数：
  7

文献信息

• ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20160347709A1

  公开（公告）日：2016-12-01

  Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, acid generators are provided that comprise one or more hydrophilic moieties.

  提供了一些作为光刻胶组分特别有用的酸发生剂化合物。在一个首选方面，提供了包含一个或多个亲水性基团的酸发生剂。
• ARYL ACETATE ONIUM MATERIALS
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20150093709A1

  公开（公告）日：2015-04-02

  Acid generators comprising a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety are provided. These acid generators are particularly useful as a photoresist composition component.

  提供了一种包括至少一个乙酸基取代的环状芳基或杂环芳基的酸发生剂。这些酸发生剂在光刻胶组分中特别有用。
• POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONALITY AND BASE-SOLUBILITY-ENHANCING FUNCTIONALITY, AND ASSOCIATED PHOTORESIST COMPOSITION AND ELECTRONIC DEVICE FORMING METHOD
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20160102158A1

  公开（公告）日：2016-04-14

  A polymer includes repeat units, most of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. Each of the photoacid-generating repeat units comprises an anion and a photoacid-generating cation that collectively have structure (I) wherein q, r, R 1 , m, X, and Z − are defined herein. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

  一种聚合物包括重复单元，其中大部分是光酸生成重复单元。每个光酸生成重复单元包括光酸生成功能和增强碱溶性功能。每个光酸生成重复单元包括阴离子和光酸生成阳离子，共同具有结构（I），其中q、r、R1、m、X和Z-在此定义。该聚合物可用作光刻胶组分的一部分，该光刻胶组分还包括第二种聚合物，在酸的作用下在碱性显影剂中表现出溶解度的变化。
• PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRONIC DEVICE
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20160103391A1

  公开（公告）日：2016-04-14

  A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.

  一种光阻组合物包括第一聚合物，其中至少一半的重复单元是光酸生成重复单元，并且第二聚合物在酸的作用下在碱性显影剂中表现出溶解度的变化。在第一聚合物中，每个光酸生成重复单元包括光酸生成性能和碱性溶解度增强性能。
• PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE
  申请人：ROHM AND HAAS ELECTRONIC MATERIALS LLC

  公开号：US20150177615A1

  公开（公告）日：2015-06-25

  A copolymer include repeat units derived from an acid-labile monomer, an aliphatic lactone-containing monomer, a C 1-12 alkyl (meth)acrylate in which the C 1-12 alkyl group includes a specific base-soluble group, a photoacid-generating monomer that includes an aliphatic anion, and a neutral aromatic monomer having the formula wherein R 1 , R 2 , R 3 , X, m, and R 5 are defined herein. The copolymer is used as a component of a photoresist composition. A coated substrate including a layer of the photoresist composition, and a method of forming an electronic device using the coated substrate are described.