Acid generators comprising a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety are provided. These acid generators are particularly useful as a photoresist composition component.
本发明提供了一种包括至少一个
醋酸基团取代的碳环芳基或杂环芳基的酸发生剂。这些酸发生剂作为光刻胶组分特别有用。