Difluoro-(2,4,6-tricyclohexylphenoxy)sulfonylmethanesulfinic acid

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Difluoro-(2,4,6-tricyclohexylphenoxy)sulfonylmethanesulfinic acid
• 英文别名: difluoro-(2,4,6-tricyclohexylphenoxy)sulfonylmethanesulfinic acid
• 化学式: C₂₅H₃₆F₂O₅S₂
• 分子量: 518.7
• InChiKey: PPBIQMSENYQOFN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  9.1
• 重原子数：
  34
• 可旋转键数：
  7
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.76
• 拓扑面积：
  108
• 氢给体数：
  1
• 氢受体数：
  8

文献信息

• Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device
  申请人：FUJIFILM Corporation

  公开号：US10545405B2

  公开（公告）日：2020-01-28

  Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.

  本发明提供了一种感光性或辐射敏感性树脂组合物，包括在酸的作用下在碱显影剂中的溶解度降低的化合物 (A)、具有在碱显影剂中分解以增加在碱显影剂中的溶解度的基团且至少具有一个氟原子或硅原子的树脂 (B) 以及具有与树脂 (B) 不同的酚羟基的树脂 (C)、使用感光性或辐射敏感性胶片和掩膜坯形成的感光性或辐射敏感性胶片和掩膜坯、和一种具有不同于树脂（B）的酚羟基的树脂（C），一种感光胶片或感光胶片和一种掩膜坯，它们分别使用感光胶片或感光胶片树脂组合物形成，一种使用感光胶片或感光胶片树脂组合物的图案形成方法，以及一种制造电子设备的方法。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20170351176A1

  公开（公告）日：2017-12-07

  Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.
• US9612535B2
  申请人：——

  公开号：US9612535B2

  公开（公告）日：2017-04-04
• US9915870B2
  申请人：——

  公开号：US9915870B2

  公开（公告）日：2018-03-13