2,3,5,6-Tetrafluoro-4-(2-methylprop-2-enoyloxymethyl)benzenesulfonic acid

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2,3,5,6-Tetrafluoro-4-(2-methylprop-2-enoyloxymethyl)benzenesulfonic acid
• 英文别名: 2,3,5,6-tetrafluoro-4-(2-methylprop-2-enoyloxymethyl)benzenesulfonic acid
• 化学式: C₁₁H₈F₄O₅S
• 分子量: 328.24
• InChiKey: AWCIWHPGOULNJB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.7
• 重原子数：
  21
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.18
• 拓扑面积：
  89
• 氢给体数：
  1
• 氢受体数：
  9

文献信息

• COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
  申请人：Rohm and Haas Electronic Materials Korea Ltd.

  公开号：US20170283651A1

  公开（公告）日：2017-10-05

  Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that a blend of two or more resins, where one resin has epoxy groups either pendant or fused to the polymer backbone. Preferred coating compositions include: 1) a first resin that comprises one or more epoxy reactive groups; and 2) a crosslinker resin that is distinct from the first resin and comprises epoxy groups.