(1-Ethylcyclopentyl) 2-[2,6-dimethyl-4-(2-phenylphenyl)sulfanylphenoxy]acetate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: (1-Ethylcyclopentyl) 2-[2,6-dimethyl-4-(2-phenylphenyl)sulfanylphenoxy]acetate
• 英文别名: (1-ethylcyclopentyl) 2-[2,6-dimethyl-4-(2-phenylphenyl)sulfanylphenoxy]acetate
• 化学式: C₂₉H₃₂O₃S
• 分子量: 460.6
• InChiKey: RRVZJKSJPRAYNY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  8.2
• 重原子数：
  33
• 可旋转键数：
  9
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.34
• 拓扑面积：
  60.8
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• ACID GENERATORS AND PHOTORESISTS COMPRISING SAME
  申请人：Rohm and Haas Electronic Materials, LLC

  公开号：US20160002199A1

  公开（公告）日：2016-01-07

  Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.

  提供了一些作为光刻胶组分特别有用的酸发生剂化合物。首选的酸发生剂包括含有共价连接的酸敏感基团的环状硫铵化合物。
• POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONALITY AND BASE-SOLUBILITY-ENHANCING FUNCTIONALITY, AND ASSOCIATED PHOTORESIST COMPOSITION AND ELECTRONIC DEVICE FORMING METHOD
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20160102158A1

  公开（公告）日：2016-04-14

  A polymer includes repeat units, most of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. Each of the photoacid-generating repeat units comprises an anion and a photoacid-generating cation that collectively have structure (I) wherein q, r, R 1 , m, X, and Z − are defined herein. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

  一种聚合物包括重复单元，其中大部分是光酸生成重复单元。每个光酸生成重复单元包括光酸生成功能和增强碱溶性功能。每个光酸生成重复单元包括阴离子和光酸生成阳离子，共同具有结构（I），其中q、r、R1、m、X和Z-在此定义。该聚合物可用作光刻胶组分的一部分，该光刻胶组分还包括第二种聚合物，在酸的作用下在碱性显影剂中表现出溶解度的变化。
• US9499513B2
  申请人：——

  公开号：US9499513B2

  公开（公告）日：2016-11-22