5-溴-4-仲-丁基嘧啶 | 52578-55-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 5-溴-4-仲-丁基嘧啶
• 中文别名: 5,5'-亚磺酰二间苯二酚
• 英文名称: Diresorcylsulfoxid
• 英文别名: 5,5'-sulfinylbisresorcinol；5,5'-Sulphinylbisresorcinol；5-(3,5-dihydroxyphenyl)sulfinylbenzene-1,3-diol
• CAS: 52578-55-9
• 化学式: C₁₂H₁₀O₅S
• 分子量: 266.274
• InChiKey: QGUGHEPTGGWCBY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.3
• 重原子数：
  18
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  117
• 氢给体数：
  4
• 氢受体数：
  6

安全信息

• 海关编码：
  2930909090

文献信息

• ADHESIVE COMPOSITION FOR BONDING WATER AND SUPPORTING BODY FOR SAID WAFER, ADHESIVE FILM, AND LAMINATE
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：EP2757136A1

  公开（公告）日：2014-07-23

  The adhesive composition for bonding a wafer and a support for the wafer according to the present invention contains an elastomer in which a styrene unit is contained as a constituent unit of a main chain, a content of the styrene unit is 14% by weight to 50% by weight, and a weight average molecular weight is 10,000 to 200,000.

  根据本发明，用于粘合晶片和晶片支撑物的粘合剂组合物含有一种弹性体，其中苯乙烯单元作为主链的组成单元，苯乙烯单元的含量为 14% 至 50%（按重量计），重量平均分子量为 10,000 至 200,000。
• Anti-reflective coating composition, multilayer photoresist material using the same, and method for forming pattern
  申请人：——

  公开号：US20020055064A1

  公开（公告）日：2002-05-09

  Disclosed is an anti-reflective coating composition for forming an anti-reflective coating as an undercoating layer is provided, comprising a crosslinking agent, which is at least one compound selected from nitrogen-containing compounds having an amino group(s) and/or an imino group(s) at least two hydrogen atoms of which are substituted by a hydroxyalkyl group(s) and/or an alkoxyalkyl group(s), and an acidic compound, wherein the crosslinking agent is such that the proportion of its low-molecular-weight component not larger than a trimer is adjusted to be 15 wt % or less; a multilayer photoresist material using the composition; and a method for forming a pattern. According to the present invention, even in the formation of a hyperfine pattern, it is possible to provide a photoresist pattern having a rectangular cross-sectional profile in relation to the substrate without causing any undesirable phenomena, such as footing, undercutting, etc. at is bottom.

  本发明公开了一种用于形成作为底涂层的减反射涂层的减反射涂层组合物，该组合物包含一种交联剂，该交联剂是至少一种选自具有氨基和/或亚氨基的含氮化合物的化合物，其至少两个氢原子被羟基烷基和/或烷氧基烷基取代、和一种酸性化合物，其中交联剂应使其不大于三聚体的低分子量组分的比例调整为 15 wt % 或更少；使用该组合物的多层光阻材料；以及形成图案的方法。根据本发明，即使在形成超细图案的过程中，也可以提供相对于基底具有矩形横截面轮廓的光刻胶图案，而不会在底部造成任何不良现象，如底脚、下切等。
• Method for filling fine hole
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20030032280A1

  公开（公告）日：2003-02-13

  A method for filling a fine hole, having a hole pattern diameter of less than or equal to 0.18 &mgr;m, comprising the following steps of: (i) filling the fine hole with filler which is obtained by dissolving into an organic solvent a nitrogen-containing compound having mean molecular weight of less than or equal to 800 and containing at least one kind selected from melamine, benzoguanamine, acetoguanamine, glycol uryl, urea, thiourea, guanidine, alkyleneurea and succinylamide, in which hydrogen atoms of amino groups are substituted by at least one of hydroxyalkyl groups and alkoxyalkyl groups or both of the groups; (ii) drying the filler; and (iii) heating said filler at a temperature of 150-250° C., whereby no bubble is generated when the fine hole is filled.

  一种填充细孔的方法，其孔型直径小于或等于 0.18 &mgr;m，包括以下步骤：(i) 用填料填充细孔，该填料是通过将平均分子量小于或等于 800 的含氮化合物溶解到有机溶剂中得到的，该化合物含有至少一种选自三聚氰胺、苯并胍胺、乙酰胍胺、乙二醇尿素、脲、硫脲、胍、亚烷基脲和琥珀酰氨的基团，其中氨基的氢原子被羟基烷基和烷氧基烷基中的至少一个基团或这两个基团取代；(iii) 在 150-250°C 的温度下加热所述填料。,从而在填充细孔时不会产生气泡。
• Phosphorus-containing compound
  申请人：CHANG CHUN PLASTICS CO., LTD.

  公开号：US20040077825A1

  公开（公告）日：2004-04-22

  A phosphorus-containing compound represented by formula (I) and a preparation method thereof are provided. An addition reaction is performed for an organic cyclic phosphorus compound with an aryl aldehyde compound, and then a condensation reaction is performed with an aryl compound having active hydrogen in the use of an organic acid as a catalyst to obtain the proposed phosphorus-containing compound. This phosphorus-containing compound can be used as a hardener for resin, and improves flame retardant properties and thermal resistance for a flame retardant epoxy resin composition, thereby suitably applied to resin compositions used for manufacturing printed circuit boards and laminated circuit boards in electronic or electric products. 1

  本发明提供了一种由式（I）表示的含磷化合物及其制备方法。先将有机环状磷化合物与芳基醛化合物进行加成反应，然后在有机酸作为催化剂的情况下与具有活泼氢的芳基化合物进行缩合反应，从而得到拟议的含磷化合物。这种含磷化合物可用作树脂的固化剂，并可提高阻燃环氧树脂组合物的阻燃性能和耐热性，从而适用于电子或电气产品中用于制造印刷电路板和层压电路板的树脂组合物。 1
• Flame retarding resin composition
  申请人：——

  公开号：US20040077821A1

  公开（公告）日：2004-04-22

  Disclosed is a flame retarding resin composition comprising (A) one or more epoxy resins; (B) a hardener; and (C) a hardening accelerator, wherein the hardener of the component B is a phosphorus-containing compound represented by the following formula (I): 1 wherein each symbol is as defined below. The flame retarding resin composition of the present invention without adding halogen or other flame retardants has high flame retardancy and excellent heat resistance. The flame retarding resin composition of the present invention is suitably useful in the application of thermosetting resins, thermoplastic resins, bonding sheets, composite materials, laminated plates, printed circuit boards, copper foil adhesives, inks used for build-up process, semiconductor molding materials and the like.

  本发明公开了一种阻燃树脂组合物，该组合物包含(A)一种或多种环氧树脂；(B)一种固化剂；以及(C)一种硬化促进剂，其中成分 B 的固化剂是由下式(I)表示的含磷化合物： 1 其中各符号定义如下。本发明的阻燃树脂组合物不添加卤素或其他阻燃剂，具有高阻燃性和优异的耐热性。本发明的阻燃树脂组合物适用于热固性树脂、热塑性树脂、粘合片、复合材料、层压板、印刷电路板、铜箔粘合剂、用于堆积工艺的油墨、半导体成型材料等。