1-(2-Propan-2-yloxyethoxy)-4-[2-(4-propan-2-ylperoxyphenyl)propan-2-yl]benzene

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1-(2-Propan-2-yloxyethoxy)-4-[2-(4-propan-2-ylperoxyphenyl)propan-2-yl]benzene
• 英文别名: 1-(2-propan-2-yloxyethoxy)-4-[2-(4-propan-2-ylperoxyphenyl)propan-2-yl]benzene
• 化学式: C₂₃H₃₂O₄
• 分子量: 372.5
• InChiKey: PKBFJSYJUSLCGW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.2
• 重原子数：
  27
• 可旋转键数：
  10
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.48
• 拓扑面积：
  36.9
• 氢给体数：
  0
• 氢受体数：
  4

文献信息

• RESIST UNDER LAYER FILM COMPOSITION AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160358777A1

  公开（公告）日：2016-12-08

  The present invention provides a resist under layer film composition containing a novolak resin having a repeating unit shown by the formula (1) and either or both of a novolak resin having a repeating unit shown by the formula (2) and a bisnaphthol derivative shown by the formula (3). There is provided a resist under layer film composition that is excellent in filling property, generates little outgas, and has excellent dry etching resistance and heat resistance.
• METHOD FOR PRODUCING POLYMER
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170097567A1

  公开（公告）日：2017-04-06

  A polymer comprising recurring units having an acid generator bound to the backbone, and recurring units having an optionally acid labile group-substituted carboxyl group and/or recurring units having an optionally acid labile group-substituted hydroxyl group is obtained by polymerizing corresponding monomers in a solution of a non-polymerizable compound containing a nitrogen atom to which an acid labile group is bound. This prevents deprotection reaction of the acid labile group in the case of positive resist-forming polymer or crosslinking reaction in the case of negative resist-forming polymer.
• US9017922B2
  申请人：——

  公开号：US9017922B2

  公开（公告）日：2015-04-28
• US9899218B2
  申请人：——

  公开号：US9899218B2

  公开（公告）日：2018-02-20