[3-(1,1,1,3,3,3-Hexafluoro-2-methylpropan-2-yl)-4-hydroxyphenyl] 2-methylprop-2-enoate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚酯
• 英文名称: [3-(1,1,1,3,3,3-Hexafluoro-2-methylpropan-2-yl)-4-hydroxyphenyl] 2-methylprop-2-enoate
• 英文别名: [3-(1,1,1,3,3,3-hexafluoro-2-methylpropan-2-yl)-4-hydroxyphenyl] 2-methylprop-2-enoate
• 化学式: C₁₄H₁₂F₆O₃
• 分子量: 342.23
• InChiKey: KAICUDJUCHEZFP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.1
• 重原子数：
  23
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.36
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  9

文献信息

• PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRONIC DEVICE
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20160103392A1

  公开（公告）日：2016-04-14

  A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.

  一种光阻组合物包括第一聚合物，其中至少一半的重复单元是光酸发生重复单元，并且第二聚合物在酸的作用下在碱性显影剂中表现出溶解度的变化。在第一聚合物中，每个光酸发生重复单元都包括光酸发生性能和碱溶性增强性能。
• Polymer composition and photoresist comprising same
  申请人：Kramer John W.

  公开号：US10025181B2

  公开（公告）日：2018-07-17

  A polymer comprises the polymerized product of monomers comprising an acid-deprotectable monomer, a base-soluble monomer, a lactone-containing monomer, and a photoacid-generating monomer; a chain transfer agent of the formula; wherein Z is a y valent C1-20 organic group, x is 0 or 1, Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl; and optionally, an initiator.

  一种聚合物由以下单体的聚合产物组成：一种可酸保护的单体、一种碱溶性单体、一种含内酯的单体和一种产生光酸的单体；一种链转移剂，其化学式为 其中 Z 是 y 价 C1-20 有机基团，x 是 0 或 1，Rd 是取代或未取代的 C1-20 烷基、C3-20 环烷基、C6-20 芳基或 C7-20 芳烷基；以及可选的引发剂。
• PHOTOACID-GENERATING COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE
  申请人：ROHM AND HAAS ELECTRONIC MATERIALS LLC

  公开号：US20150177613A1

  公开（公告）日：2015-06-25

  A copolymer include repeat units derived from an acid-labile monomer, an aliphatic lactone-containing monomer, a C 1-12 alkyl (meth)acrylate in which the C 1-12 alkyl group includes a specific base-soluble group, a photoacid-generating monomer that includes an aliphatic anion, and a neutral aromatic monomer having the formula wherein R 1 , R 2 , R 3 , X, m, and Ar are defined herein. The copolymer is used as a component of a photoresist composition. A coated substrate including a layer of the photoresist composition, and a method of forming an electronic device using the coated substrate are described.
• US9182669B2
  申请人：——

  公开号：US9182669B2

  公开（公告）日：2015-11-10
• US9229319B2
  申请人：——

  公开号：US9229319B2

  公开（公告）日：2016-01-05