(4-Octylphenyl)methyl prop-2-enoate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: (4-Octylphenyl)methyl prop-2-enoate
• 英文别名: (4-octylphenyl)methyl prop-2-enoate
• 化学式: C₁₈H₂₆O₂
• 分子量: 274.4
• InChiKey: QBFUNHXMCQZUNN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.2
• 重原子数：
  20
• 可旋转键数：
  11
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• Curable composition for imprinting, cured product, pattern forming method, and lithography method
  申请人：FUJIFILM Corporation

  公开号：US10990011B2

  公开（公告）日：2021-04-27

  Provided are a curable composition for imprinting and a cured product, a pattern forming method, and a lithography method in which the curable composition for imprinting is used, the curable composition having excellent resolution ability, filling properties into a mold, and releasability from a mold in a case where a fine pattern having a size of 20 nm or less is prepared. The curable composition for imprinting includes: a monofunctional polymerizable compound; a bifunctional polymerizable compound; and a photopolymerization initiator, in which a content of the monofunctional polymerizable compound is 5 to 30 mass % with respect to a content of all the polymerizable compounds, a content of the bifunctional polymerizable compound is 70 mass % or higher with respect to a content of all the polymerizable compounds, at least one bifunctional polymerizable compound is a bifunctional polymerizable compound in which the number of atoms linking two polymerizable groups to each other is 2 or less, and a content of a bifunctional polymerizable compound that does not include an alicyclic structure and an aromatic ring structure and in which the number of atoms linking two polymerizable groups to each other is 3 or more is 30 mass % or lower with respect to the content of all the polymerizable compounds.

  本发明提供了一种压印用可固化组合物和固化产品、一种图案形成方法以及一种光刻方法，其中使用了该压印用可固化组合物，该可固化组合物在制备尺寸为 20 nm 或更小的精细图案的情况下，具有出色的解析能力、对模具的填充性能以及从模具的脱模性。用于压印的可固化组合物包括单官能团可聚合化合物； 双官能团可聚合化合物；和光聚合引发剂，其中单官能团可聚合化合物的含量占所有可聚合化合物含量的 5% 至 30%，双官能团可聚合化合物的含量占所有可聚合化合物含量的 70% 或更高、至少一种双官能团可聚合化合物是连接两个可聚合基团的原子数为 2 个或更少 的双官能团可聚合化合物，且不包括脂环结构和芳香环结构且连接两个可聚合基团 的原子数为 3 个或更多的双官能团可聚合化合物的含量相对于所有可聚合化合物的 含量为 30 质量％或更低。
• CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN
  申请人：FUJIFILM Corporation

  公开号：US20140121292A1

  公开（公告）日：2014-05-01

  Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising at least one kind of polymerizable monomer selected from the following compounds and a photopolymerization initiator;
• CURABLE COMPOSITION FOR IMPRINTS, CURED PRODUCT, PATTERN FORMING METHOD, LITHOGRAPHY METHOD, PATTERN AND LITHOGRAPHY MASK
  申请人：FUJIFILM Corporation

  公开号：US20180037688A1

  公开（公告）日：2018-02-08

  Provided are a curable composition for imprints which is capable of both improving releasability and suppressing occurrence of waviness during etching, as well as a cured product, a pattern forming method, a lithography method, a pattern, and a lithography mask, each of which uses the curable composition for imprints. The curable composition for imprints includes a monofunctional polymerizable compound, a polyfunctional polymerizable compound containing at least one of an alicyclic structure or an aromatic ring structure and having a viscosity at 25° C. of 150 mPa·s or less, and a photopolymerization initiator, in which the monofunctional polymerizable compound is contained in an amount of 5 to 30 mass % with respect to the total polymerizable compound in the curable composition for imprints, and the cured film of the curable composition for imprints has a modulus of elasticity of 3.5 GPa or less and a glass transition temperature of 90° C. or higher.
• CURABLE COMPOSITION FOR IMPRINTING, CURED PRODUCT, PATTERN FORMING METHOD, AND LITHOGRAPHY METHOD
  申请人：FUJIFILM Corporation

  公开号：US20190163059A1

  公开（公告）日：2019-05-30

  Provided are a curable composition for imprinting and a cured product, a pattern forming method, and a lithography method in which the curable composition for imprinting is used, the curable composition having excellent resolution ability, filling properties into a mold, and releasability from a mold in a case where a fine pattern having a size of 20 nm or less is prepared. The curable composition for imprinting includes: a monofunctional polymerizable compound; a bifunctional polymerizable compound; and a photopolymerization initiator, in which a content of the monofunctional polymerizable compound is 5 to 30 mass % with respect to a content of all the polymerizable compounds, a content of the bifunctional polymerizable compound is 70 mass % or higher with respect to a content of all the polymerizable compounds, at least one bifunctional polymerizable compound is a bifunctional polymerizable compound in which the number of atoms linking two polymerizable groups to each other is 2 or less, and a content of a bifunctional polymerizable compound that does not include an alicyclic structure and an aromatic ring structure and in which the number of atoms linking two polymerizable groups to each other is 3 or more is 30 mass % or lower with respect to the content of all the polymerizable compounds.
• COMPOSITION FOR FORMING PRIMER LAYER FOR IMPRINTING, PRIMER LAYER FOR IMPRINTING, AND LAMINATE
  申请人：FUJIFILM Corporation

  公开号：US20190212647A1

  公开（公告）日：2019-07-11

  An object of the present invention is to improve wettability of a curable composition for imprinting on a substrate. There is provided a novel composition for forming a primer layer for imprinting, a primer layer in which the above-described composition for forming a primer layer is used, and a laminate. Provided is a composition for forming a primer layer for imprinting which satisfies at least one of A and B. A: A component having a surface tension of greater than or equal to 40 mN/m at 25° C. is contained. B: A critical surface tension of a primer layer formed of the composition for forming a primer layer for imprinting is greater than or equal to 46 mN/m at 25° C.