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2-(4-Methylphenyl)-5-(13-methyl-5,7,12,14-tetraoxo-6,13-diazatetracyclo[6.6.2.04,16.011,15]hexadeca-1(15),2,4(16),8,10-pentaen-6-yl)benzenesulfonic acid

中文名称
——
中文别名
——
英文名称
2-(4-Methylphenyl)-5-(13-methyl-5,7,12,14-tetraoxo-6,13-diazatetracyclo[6.6.2.04,16.011,15]hexadeca-1(15),2,4(16),8,10-pentaen-6-yl)benzenesulfonic acid
英文别名
2-(4-methylphenyl)-5-(13-methyl-5,7,12,14-tetraoxo-6,13-diazatetracyclo[6.6.2.04,16.011,15]hexadeca-1(15),2,4(16),8,10-pentaen-6-yl)benzenesulfonic acid
2-(4-Methylphenyl)-5-(13-methyl-5,7,12,14-tetraoxo-6,13-diazatetracyclo[6.6.2.04,16.011,15]hexadeca-1(15),2,4(16),8,10-pentaen-6-yl)benzenesulfonic acid化学式
CAS
——
化学式
C28H18N2O7S
mdl
——
分子量
526.5
InChiKey
RKFHAOJLHJNQJU-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.4
  • 重原子数:
    38
  • 可旋转键数:
    3
  • 环数:
    6.0
  • sp3杂化的碳原子比例:
    0.07
  • 拓扑面积:
    138
  • 氢给体数:
    1
  • 氢受体数:
    7

文献信息

  • NEAR-INFRARED-RAY-ABSORBING COMPOSITION, NEAR-INFRARED-RAY CUT FILTER USING SAME, MANUFACTURING METHOD THEREFOR, CAMERA MODULE, AND MANUFACTURING METHOD THEREFOR
    申请人:FUJIFILM CORPORATION
    公开号:US20160037034A1
    公开(公告)日:2016-02-04
    Provided are a near-infrared-ray-absorbing composition having strong near-infrared shielding properties when a cured film is produced, a near-infrared-ray cut filter, a manufacturing method therefor, a camera module, and a manufacturing method therefor. The near-infrared-ray-absorbing composition includes a copper complex obtained by reacting a compound (A) having at least two coordination sites with a copper component.
    提供了一种近红外光吸收组合物,当产生固化膜时具有强大的近红外屏蔽性能,以及一种近红外光切割滤光片、其制造方法、相机模块以及其制造方法。该近红外光吸收组合物包括通过将至少具有两个配位位点的化合物(A)与铜组分反应而获得的铜配合物。
  • DEPOSITING POLYMER SOLUTIONS TO FORM OPTICAL DEVICES
    申请人:LIGHT POLYMERS HOLDING
    公开号:US20140322452A1
    公开(公告)日:2014-10-30
    Provided are methods of depositing polymer solutions on substrates to form various optical elements. A polymer solution may include about 0.1%-0% by weight of a specific polymer having rigid rod-like molecules. The molecules may include various cores, spacers, and sides groups to ensure their solubility, viscosity, and cross-linking ability. The deposition techniques may include slot die, spray, molding, roll coating, and so forth. Pre-deposition techniques may be used to improve wettability and adhesion of substrates. Post-deposition techniques may include ultraviolet cross-linking, specific drying techniques, evaporation of solvent, treating with salt solutions, and shaping. The disclosed polymers and deposition processes may yield optical elements with high refractive index values, such as greater than 1.6. These optical elements may be used as +A plates, −C plates, or biaxial polymers and used as retarders in LCD active panels or as light collimators and light guides.
  • NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT FILTER OBTAINED USING SAME, PROCESS FOR PRODUCING SAID CUT FILTER, CAMERA MODULE AND PROCESS FOR PRODUCING SAME, AND SOLID PHOTOGRAPHING ELEMENT
    申请人:FUJIFILM Corporation
    公开号:US20160178816A1
    公开(公告)日:2016-06-23
    Provided are a near-infrared-absorbing composition capable of forming a cured film having excellent heat resistance while maintaining high near-infrared-shielding properties, a near-infrared cut filter obtained using the same, a process for producing said cut filter, a camera module and a process for producing the same, and a solid photographing element. The near-infrared-absorbing composition includes a near-infrared-absorbing compound (A1) obtained from a reaction between a low-molecular-weight compound which has two or more coordination sites to a metal component or a coordination site to a metal component and a cross-linking group and has a molecular weight of 1800 or lower or a salt thereof and the metal component and a near-infrared-absorbing compound (B) obtained from a reaction between a high-molecular-weight compound having a repeating unit represented by Formula (II) below or a salt thereof and a metal component. In Formula (II), R 2 represents an organic group, Y 1 represents a single bond or a divalent linking group, and X 2 represents the coordination site to the metal component.
  • SELF-HEALING CAPACITOR AND METHODS OF PRODUCTION THEREOF
    申请人:Capacitor Sciences Incorporated
    公开号:US20160254092A1
    公开(公告)日:2016-09-01
    A self-healing capacitor comprises a first electrode, a second electrode, and a dielectric layer disposed between said first and second electrodes and having first surface faced the first electrode and second surface faced the second electrode. At least one of the electrodes can include metal foam. The dielectric layer can have electrically conductive channels that each has an exit point located on the first surface of the dielectric layer and another exit point located on the second surface of the dielectric layer. The electrodes can include local contact breakers each of which is located within the electrode at an interface between the dielectric layer and the electrode and opposite at least one exit point of each electrically conductive channel in the dielectric layer. The local contact breakers can prevent electric current through the conductive channels in dielectric layer.
  • ENERGY STORAGE DEVICES AND METHODS OF PRODUCTION THEREOF
    申请人:CAPACITOR SCIENCES INCORPORATED
    公开号:US20160314901A1
    公开(公告)日:2016-10-27
    The present disclosure provides an energy storage device comprising a first electrode, a second electrode, and a solid multilayer structure disposed between said first and second electrodes. The solid multilayer structure can be in contact with said first and second electrodes. The solid multilayer structure can include layers disposed parallel to said electrodes, the layers have a sequence (A-B) m -A, wherein, A is an insulating layer and B is a polarization layer comprising a colloidal composite with a micro-dispersion of electro-conductive nano-particles in an insulator matrix, and ‘m’ is a number greater than or equal to 1. Layer A can have a breakdown voltage of at least about 0.05 volts per nanometer (nm), and layer B can have a dielectric permittivity of at least about 100.
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