3-[3-[4-[(2-Methylpropan-2-yl)oxycarbonyl]phenyl]propoxy]-3-oxopropanoic acid

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 3-[3-[4-[(2-Methylpropan-2-yl)oxycarbonyl]phenyl]propoxy]-3-oxopropanoic acid
• 英文别名: 3-[3-[4-[(2-methylpropan-2-yl)oxycarbonyl]phenyl]propoxy]-3-oxopropanoic acid
• 化学式: C₁₇H₂₂O₆
• 分子量: 322.4
• InChiKey: FGKNOWVHEMKFSD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  23
• 可旋转键数：
  10
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.47
• 拓扑面积：
  89.9
• 氢给体数：
  1
• 氢受体数：
  6

文献信息

• [EN] METHANOFULLERENES<br/>[FR] MÉTHANOFULLERRÈNES
  申请人：ROBINSON ALEX PHILIP GRAHAM

  公开号：WO2014078097A1

  公开（公告）日：2014-05-22

  The present disclosure relates to novel methanofullerene derivatives, negative- type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

  本公开涉及新型甲烷富勒烯衍生物，由此制备的负型光刻胶组合物以及使用它们的方法。这些衍生物，它们的光刻胶组合物和方法非常适合使用紫外线辐射、超过极紫外线辐射、极紫外线辐射、X射线和带电粒子射线等技术进行精细图案处理。
• [EN] METHANOFULLERENES<br/>[FR] MÉTHANOFULLERÈNES
  申请人：ROBINSON ALEX PHILIP GRAHAM

  公开号：WO2014137663A1

  公开（公告）日：2014-09-12

  The present disclosure relates to novel methanofullerene derivatives, negative- type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.

  本公开涉及新型甲烷富勒烯衍生物，制备其负型光阻组合物和使用它们的方法。这些衍生物、它们的光阻组合物和方法非常适合使用紫外线辐射、超过极紫外线辐射、极紫外线辐射、X射线和带电粒子射线进行精细图案处理。还公开了负光敏组合物。
• METHANOFULLERENES
  申请人：Robinson, Alex Philip, Graham

  公开号：EP2920142A1

  公开（公告）日：2015-09-23
• [EN] FULLERENES<br/>[FR] FULLERÈNES
  申请人：ROBINSON ALEX PHILIP GRAAHAM

  公开号：WO2014190070A1

  公开（公告）日：2014-11-27

  The present disclosure relates to novel fullerene derivatives, positive and negative photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays.