Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element
申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:US10023540B2
公开(公告)日:2018-07-17
To provide a hydrogen barrier agent capable of imparting hydrogen barrier performance to various materials; a hydrogen barrier film forming composition including the hydrogen barrier agent; a hydrogen barrier film including the hydrogen barrier agent; a method for producing a hydrogen barrier film, which uses the hydrogen barrier film forming composition; and an electronic element provided with the hydrogen barrier film. A compound having a specific structure including an imidazolyl group is used as the hydrogen barrier agent. Furthermore, the hydrogen barrier film forming composition is prepared by blending the above-mentioned hydrogen barrier agent into the base material component. In addition, the hydrogen barrier film is formed using the hydrogen barrier film forming composition.
提供一种能使各种材料具有氢阻隔性能的氢阻隔剂;一种包括该氢阻隔剂的氢阻隔薄膜形成组合物;一种包括该氢阻隔剂的氢阻隔薄膜;一种使用该氢阻隔薄膜形成组合物生产氢阻隔薄膜的方法;以及一种带有该氢阻隔薄膜的电子元件。氢阻隔剂使用了一种具有特定结构的化合物,其中包括咪唑基团。此外,氢阻隔膜形成组合物是通过将上述氢阻隔剂与基础材料成分混合而制备的。此外,使用氢阻隔膜形成组合物形成氢阻隔膜。