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3,3-Difluoro-2,2,5-trimethylhexane

中文名称
——
中文别名
——
英文名称
3,3-Difluoro-2,2,5-trimethylhexane
英文别名
3,3-difluoro-2,2,5-trimethylhexane
3,3-Difluoro-2,2,5-trimethylhexane化学式
CAS
——
化学式
C9H18F2
mdl
——
分子量
164.24
InChiKey
NIDRNEGMKSHUJH-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4.3
  • 重原子数:
    11
  • 可旋转键数:
    3
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    0
  • 氢给体数:
    0
  • 氢受体数:
    2

文献信息

  • SEPARATOR FOR ELECTROCHEMICAL DEVICE AND METHOD FOR MANUFACTURING SAME
    申请人:LG CHEM, LTD.
    公开号:EP3761401A1
    公开(公告)日:2021-01-06
    Provided is a separator for an electrochemical device including a first block having repeating units represented by Chemical Formula 1 and a second block having repeating units represented by Chemical Formula 2. A method for manufacturing the same is also provided. The separator shows low resistance, improved adhesion to an electrode and improved swelling property with a solvent.
    本发明提供了一种用于电化学装置的分离器,包括具有化学式 1 所代表的重复单元的第一区块和具有化学式 2 所代表的重复单元的第二区块。同时还提供了一种制造方法。该隔膜电阻低,与电极的附着力提高,与溶剂的溶胀性能提高。
  • [EN] ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN<br/>[FR] COMPOSITION DE RÉSINE ET FILM SENSIBLES AUX RAYONS ACTINIQUES OU À LA RADIATION ACTINIQUE ET PROCÉDÉ DE FORMATION DE MOTIF
    申请人:FUJIFILM CORP
    公开号:WO2014104400A1
    公开(公告)日:2014-07-03
    Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (A) and any of compounds (B) of general formula (I) below. (In general formula (I), Rf represents a fluorine atom or a monovalent organic group containing at least one fluorine atom; R1 represents a hydrogen atom or a monovalent substituent containing no fluorine atom; X1 represents a monovalent organic group having at least two carbon atoms, or a methyl group in which a substituent other than a fluorine atom is optionally introduced, provided that X1 may be bonded to R1 to thereby form a ring; and Z represents a moiety that when exposed to actinic rays or radiation, is converted to a sulfonic acid group, an imidic acid group or a methide acid group.)
  • [EN] PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND<br/>[FR] PROCÉDÉ DE FORMATION DE MOTIF, COMPOSITION DE RÉSINE SENSIBLE À DES RAYONS ACTINIQUES OU À UN RAYONNEMENT, FILM DE RÉSERVE, PROCÉDÉ DE FABRICATION DE DISPOSITIF ÉLECTRONIQUE, DISPOSITIF ET COMPOSÉ ÉLECTRONIQUES
    申请人:FUJIFILM CORP
    公开号:WO2014133187A1
    公开(公告)日:2014-09-04
    There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the specific formula, (B) a compound different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a resin that does not react with the acid generated from the compound (A) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (B), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.
  • [EN] LINCOSAMIDE ANTIBIOTICS AND USES THEREOF<br/>[FR] NOUVEAUX ANTIBIOTIQUES DE TYPE LINCOSAMIDES ET UTILISATIONS CORRESPONDANTES
    申请人:HARVARD COLLEGE
    公开号:WO2019032941A1
    公开(公告)日:2019-02-14
    Provided are lincosamide compounds for the treatment of infectious diseases. The lincosamides described herein are modified at the amino acid (southern) region. The lincosamides may have further modification at the C-1 and C-7 positions of the aminooctose (northern) region, thus distinguishing them from lincomycin and clindamycin. Also provided are methods for preparing the lincosamide compounds, pharmaceutical compositions comprising the lincosamide compounds, and methods of treating infectious diseases using the disclosed lincosamide compounds.
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