5-Methyl-5-phenyldibenzothiophene

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 5-Methyl-5-phenyldibenzothiophene
• 英文别名: 5-methyl-5-phenyldibenzothiophene
• 化学式: C₁₉H₁₆S
• 分子量: 276.4
• InChiKey: RRXCSTWWCFRTBA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.3
• 重原子数：
  20
• 可旋转键数：
  1
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.05
• 拓扑面积：
  1
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• Aryl acetate onium materials
  申请人：Rohm and Haas Electronic Materials, LLC

  公开号：US10844037B2

  公开（公告）日：2020-11-24

  Acid generators comprising a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety are provided. These acid generators are particularly useful as a photoresist composition component.

  提供了由至少一个乙酸基取代的碳环芳基或杂芳基组成的酸生成物。这些酸生成物作为光刻胶组合物成分特别有用。
• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN
  申请人：FUJIFILM Corporation

  公开号：EP2721446B1

  公开（公告）日：2017-11-22
• CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP3579050B1

  公开（公告）日：2020-11-11
• [EN] PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE<br/>[FR] PROCÉDÉ DE FORMATION DE MOTIFS, COMPOSÉ UTILISÉ DANS CE PROCÉDÉ, COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU SENSIBLE AU RAYONNEMENT, FILM DE RÉSERVE, PROCÉDÉ DE FABRICATION D'UN DISPOSITIF ÉLECTRONIQUE, ET DISPOSITIF ÉLECTRONIQUE
  申请人：FUJIFILM CORP

  公开号：WO2014119698A1

  公开（公告）日：2014-08-07

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin having a group capable of decomposing by an action of an acid to produce a polar group, (C1) a compound containing a group capable of generating a first acidic functional group upon irradiation with an actinic ray or radiation and a group capable of generating a second acidic functional group different from the first acidic functional group upon irradiation with an actinic ray or radiation, and (C2) at least one compound containing two or more groups selected from the group consisting of the groups capable of generating the structures represented by the specific formulae upon irradiation with an actinic ray or radiation.
• [EN] RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AU RAYONNEMENT, PROCÉDÉ DE FORMATION D'UN MOTIF DE RÉSERVE, POLYMÈRE ET COMPOSÉ<br/>[JA] 感放射線性樹脂組成物、レジストパターン形成方法、重合体及び化合物
  申请人：[en]JSR CORPORATION;[ja]ＪＳＲ株式会社

  公开号：WO2022196024A1

  公开（公告）日：2022-09-22

  下記式（１）で表される第１構造単位を有する重合体と、感放射線性酸発生体とを含有する感放射線性樹脂組成物。