Cyclohexyl-trimethyl-ammonium | 25728-39-6

• 物质功能分类: 化学试剂 - 有机试剂 - 胺盐（铵盐）
• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: Cyclohexyl-trimethyl-ammonium
• 英文别名: Cyclohexyl-trimethyl-azanium；cyclohexyl(trimethyl)azanium
• CAS: 25728-39-6
• 化学式: C₉H₂₀N
• 分子量: 142.264
• InChiKey: HCKMSHYCAFVSGW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.1
• 重原子数：
  10
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

文献信息

• ANTIMICROBIAL CATIONIC POLYCARBONATES
  申请人：INTERNATIONAL BUSINESS MACHINES CORPORATION

  公开号：US20140301967A1

  公开（公告）日：2014-10-09

  Antimicrobial cationic polymers having one or two cationic polycarbonate chains were prepared by organocatalyzed ring opening polymerization. One antimicrobial cationic polymer has a polymer chain consisting essentially of cationic carbonate repeat units linked to one or two end groups. The end groups can comprise a covalently bound form of biologically active compound such as cholesterol. Other antimicrobial cationic polymers have a random copolycarbonate chain comprising a minor mole fraction of hydrophobic repeat units bearing a covalently bound form of a vitamin E and/or vitamin D2. The cationic polymers exhibit high activity and selectivity against Gram-negative and Gram-positive microbes and fungi.

  具有一个或两个阳离子聚碳酸酯链的抗菌阳离子聚合物是通过有机催化的环氧开聚合制备的。其中一种抗菌阳离子聚合物具有基本由阳离子碳酸酯重复单元构成的聚合物链，与一个或两个末端基团相连。末端基团可以包括胆固醇等生物活性化合物的共价结合形式。其他抗菌阳离子聚合物具有随机共聚碳酸酯链，其中含有少量疏水重复单元，带有维生素E和/或维生素D2的共价结合形式。这些阳离子聚合物对革兰氏阴性和革兰氏阳性微生物和真菌表现出高活性和选择性。
• Quaternary ammonium salts of omega-aminoalkylamides of r-2-aryl-propionic acids and pharmaceutical compositions containing them
  申请人：——

  公开号：US20040266870A1

  公开（公告）日：2004-12-30

  (R)-Enantiomers of quaternary ammonium salts of general formula (I) are described: 1 where R, R 1 , R 2 , R 3 , X and Z are as defined in the description. The process for their preparation and pharmaceutical preparations thereof are also described. The quaternary salts of the invention are useful in the inhibition of chemotaxis of neutrophils and monocytes induced by the fraction C 5 a of the complement and are used in the treatment of psoriasis, pemphigus and pemphigoid, rheumatoid arthritis, intestinal chronic inflammatory pathologies including ulcerative colitis, acute respiratory distress syndrome, idiopathic fibrosis, cystic fibrosis, chronic obstructive pulmonary disease and glomerulonephritis. The compounds of the invention are advantageously used in the prevention and the treatment of injury caused by ischemia and reperfusion.

  通用公式(I)的(R)-对映体的季铵盐被描述：其中R、R1、R2、R3、X和Z如描述中所定义。还描述了它们的制备过程和药物制剂。本发明的季铵盐在抑制由补体C5a分数诱导的中性粒细胞和单核细胞趋化方面具有用途，并用于治疗牛皮癣、天疱疮和天疱疮、类风湿关节炎、包括溃疡性结肠炎、急性呼吸窘迫综合征、特发性纤维化、囊性纤维化、慢性阻塞性肺病和肾小球肾炎在内的肠道慢性炎症病变。本发明的化合物有利地用于预防和治疗缺血再灌注引起的损伤。
• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170131635A1

  公开（公告）日：2017-05-11

  A monomer of formula (1a) or (1b) is provided wherein A is a polymerizable group, R 1 -R 6 are monovalent hydrocarbon groups, X 1 is a divalent hydrocarbon group, Z 1 is an aliphatic group, Z 2 forms an alicyclic group, k=0 or 1, m=1 or 2, n=1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer.

  提供了一个化学式为（1a）或（1b）的单体，其中A是一个可聚合的基团，R1-R6是一价碳氢基团，X1是一个二价碳氢基团，Z1是一个脂肪基团，Z2形成一个脂环基团，k=0或1，m=1或2，n=1到4。通过聚合单体得到了一种有用的聚合物。包含该聚合物的抗蚀组合物具有改善的显影性能，并且经过处理形成具有高对比度、高分辨率和耐蚀性的负图案，该负图案在碱性显影剂中不溶。
• HEMIACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20160238930A1

  公开（公告）日：2016-08-18

  A polymer for resist use is obtainable from a hemiacetal compound having formula (1 a ) wherein R 1 is H, CH 3 or CF 3 , R 2 to R 4 each are H or a monovalent hydrocarbon group, X 1 is a divalent hydrocarbon group, ZZ designates a non-aromatic mono- or polycyclic ring of 4 to 20 carbon atoms having a hemiacetal structure, k 1 =0 or 1, and k 2 =0 to 3. A resist composition comprising the polymer displays controlled acid diffusion and low roughness during both positive and negative tone developments.

  从具有以下式（1a）的半缩醛化合物获得用于抗蚀的聚合物，其中R1为H、CH3或CF3，R2至R4分别为H或单价碳氢基团，X1为二价碳氢基团，ZZ表示具有半缩醛结构的非芳香性4至20个碳原子的单环或多环环，k1=0或1，k2=0至3。包含该聚合物的抗蚀组合物显示出在正片和负片显影过程中控制酸扩散和低粗糙度。
• PRODUCTION PROCESS FOR FLUOROSULFONYLIMIDE AMMONIUM SALT
  申请人：Tsubokura Shiro

  公开号：US20130331609A1

  公开（公告）日：2013-12-12

  A compound [II] such as ammonium N,N-di(fluorosulfonyl)imide is obtained by reacting a compound [I] such as N,N-di(chlorosulfonyl)imide and NH 4 F (HF) p . A compound [IV] such as an N,N-di(fluorosulfonyl)imide alkali metal salt is obtained by reacting the obtained compound [II] and an alkali metal compound or the like.

  通过将化合物[I]，如N,N-二(氯磺酰)亚胺和NH4F (HF)p反应，可以得到类似氨基N,N-二(氟磺酰)亚胺的化合物[II]。通过将得到的化合物[II]与碱金属化合物等反应，可以得到类似N,N-二(氟磺酰)亚胺碱金属盐的化合物[IV]。