14-[1,1'-biphenyl]-4-yl-14H-Dibenzo[a,j]xanthene-3,11-diol

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并吡喃
• 英文名称: 14-[1,1'-biphenyl]-4-yl-14H-Dibenzo[a,j]xanthene-3,11-diol
• 英文别名: 2-(4-Phenylphenyl)-13-oxapentacyclo[12.8.0.03,12.04,9.017,22]docosa-1(14),3(12),4(9),5,7,10,15,17(22),18,20-decaene-7,19-diol；2-(4-phenylphenyl)-13-oxapentacyclo[12.8.0.03,12.04,9.017,22]docosa-1(14),3(12),4(9),5,7,10,15,17(22),18,20-decaene-7,19-diol
• 化学式: C₃₃H₂₂O₃
• 分子量: 466.536
• InChiKey: MNPOGNAYYNNPCC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  8.3
• 重原子数：
  36
• 可旋转键数：
  2
• 环数：
  7.0
• sp3杂化的碳原子比例：
  0.03
• 拓扑面积：
  49.7
• 氢给体数：
  2
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  14-[1,1'-biphenyl]-4-yl-14H-Dibenzo[a,j]xanthene-3,11-diol 在 copper(l) iodide 、 吡啶盐酸盐 、 N,N-二甲基甘氨酸盐酸盐 、 caesium carbonate 作用下， 以 1,4-二氧六环 为溶剂， 反应 24.0h， 生成 4-[[19-(4-Hydroxyphenoxy)-2-(4-phenylphenyl)-13-oxapentacyclo[12.8.0.03,12.04,9.017,22]docosa-1(14),3(12),4(9),5,7,10,15,17(22),18,20-decaen-7-yl]oxy]phenol
  参考文献：
  名称：

  COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD

  摘要：

  本发明提供一种具有以下式（0）所代表的特定结构的化合物，具有从该化合物衍生的组分单元的树脂，含有该化合物和/或树脂的各种组合物，以及使用这些组合物的各种方法。

  公开号：

  US20210070685A1
• 作为产物：
  描述：

  2,6-萘二酚 、 对苯基苯甲醛 在 硫酸 作用下， 以 丁酮 为溶剂， 反应 6.0h， 以3.05 g的产率得到14-[1,1'-biphenyl]-4-yl-14H-Dibenzo[a,j]xanthene-3,11-diol
  参考文献：
  名称：

  RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM

  摘要：

  描述了一种包含由通式（1）或（2）表示的化合物的光刻胶组合物，使用该组合物形成光刻胶图案的方法，用于该组合物的多酚化合物，以及可以由其衍生的醇化合物。

  公开号：

  US20160145231A1

文献信息

• MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20180101096A1

  公开（公告）日：2018-04-12

  A material for forming an underlayer film for lithography, in which a compound represented by the following formula (0) is used. (in formula (0), each X independently represents an oxygen atom or a sulfur atom, or a non-crosslinked state, R 1 represents a 2 n -valent group having 1 to 30 carbon atoms, or a single bond, each R 0 independently represents a straight, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, a straight, branched or cyclic alkenyl group having 2 to 30 carbon atoms, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group or a hydroxyl group, the alkyl group, the alkenyl group and the aryl group each optionally include a cyanato group, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group, a hydroxyl group, an ether bond, a ketone bond or an ester bond, each m 1 is independently an integer of 0 to 4, in which at least one m 1 is an integer of 1 to 4, each m 2 is independently an integer of 0 to 3, n is an integer of 1 to 4, and each p is independently 0 or 1.)

  一种用于光刻的底层膜的材料，其中使用以下式(0)代表的化合物。(在式(0)中，每个X独立表示氧原子或硫原子，或非交联状态，R1表示具有1到30个碳原子的2n价基团，或者单键，每个R0独立表示具有1到30个碳原子的直链、支链或环烷基，具有6到30个碳原子的芳基，具有2到30个碳原子的直链、支链或环烯基，硫醇基，卤素基，硝基，氨基，羧基或羟基，烷基、烯基和芳基中每个可选包括氰酸基、硫醇基、卤素基、硝基、氨基、羧基、羟基、醚键、酮键或酯键，每个m1独立地为0到4的整数，其中至少一个m1为1到4的整数，每个m2独立地为0到3的整数，n为1到4的整数，每个p独立地为0或1。)
• COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20190010108A1

  公开（公告）日：2019-01-10

  The present invention employs a compound represented by the following formula (0): wherein R Y is a linear, branched, or cyclic alkyl group of 1 to 30 carbon atoms or an aryl group of 6 to 30 carbon atoms; R Z is an N-valent group of 1 to 60 carbon atoms or a single bond; each R T is independently an alkyl group of 1 to 30 carbon atoms optionally having a substituent, an aryl group of 6 to 40 carbon atoms optionally having a substituent, an alkenyl group of 2 to 30 carbon atoms optionally having a substituent, an alkoxy group of 1 to 30 carbon atoms optionally having a substituent, a halogen atom, a nitro group, an amino group, a cyano group, a thiol group, a hydroxy group, or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group, wherein the alkyl group, the alkenyl group, and the aryl group each optionally contain an ether bond, a ketone bond, or an ester bond, wherein at least one R T is a hydroxy group or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group; X is an oxygen atom, a sulfur atom, or not a crosslink; each m is independently an integer of 0 to 9, wherein at least one m is an integer of 1 to 9; N is an integer of 1 to 4, wherein when N is an integer of 2 or larger, N structural formulas within the parentheses [ ] are the same or different; and each r is independently an integer of 0 to 2.

  本发明采用以下式（0）所代表的化合物：其中RY是1到30个碳原子的直链、支链或环烷基基团，或者是6到30个碳原子的芳基基团；RZ是1到60个碳原子的N价基团或者是一个单键；每个RT独立地是1到30个碳原子的烷基基团，可选地带有取代基，是6到40个碳原子的芳基基团，可选地带有取代基，是2到30个碳原子的烯基基团，可选地带有取代基，是1到30个碳原子的烷氧基基团，可选地带有取代基，是卤素原子、硝基基团、氨基基团、氰基基团、硫醇基团、羟基或者羟基的氢原子被酸解离基团取代的基团，其中烷基基团、烯基基团和芳基基团每个可选地包含醚键、酮键或酯键，其中至少一个RT是羟基或者羟基的氢原子被酸解离基团取代的基团；X是氧原子、硫原子或者不是交联；每个m独立地是0到9的整数，其中至少一个m是1到9的整数；N是1到4的整数，当N是2或更大的整数时，括号中的N个结构式是相同或不同的；每个r独立地是0到2的整数。
• COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20210070727A1

  公开（公告）日：2021-03-11

  The present invention provides a compound represented by following formula (0):

  本发明提供了以下式（0）表示的化合物。
• METHOD FOR PURIFYING COMPOUND OR RESIN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20170001972A1

  公开（公告）日：2017-01-05

  The method according to the present invention is a method for purifying a compound represented by a specific formula (1) or a resin having a structure represented by a specific formula (2), the method including a step of bringing a solution (A) including an organic solvent optionally immiscible with water, and the compound or the resin into contact with an acidic aqueous solution.

  根据本发明的方法是一种用于纯化由特定化学式（1）表示的化合物或具有特定化学式（2）表示的结构的树脂的方法，该方法包括将含有有机溶剂（可选择与水不相容）的溶液（A）与该化合物或树脂接触酸性水溶液的步骤。
• (Meth)acryloyl compound and method for producing same
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US10723690B2

  公开（公告）日：2020-07-28

  A (meth)acryloyl compound represented by the following formula (A): wherein X is a 2m-valent group having 1 to 60 carbon atoms or a single bond; each Z is independently an oxygen atom, a sulfur atom, or not a crosslink; each R1 is independently a linear, branched, or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a thiol group, a hydroxy group, or a group in which a hydrogen atom of a hydroxy group is replaced with a vinylphenylmethyl group, wherein the alkyl group, the aryl group, the alkenyl group, or the alkoxy group optionally contains an ether bond, a ketone bond, or an ester bond; each R1A is independently a methyl group or a hydrogen atom; each k is independently an integer of 0 to 2, provided that all of the k moieties are not 0 at the same time; m is an integer of 1 to 3; each n is independently an integer of 0 to 5; and each p is independently 0 or 1.

  一种由以下公式（A）表示的（甲）基丙烯酰化合物：其中X是具有1至60个碳原子或单键的2m价基团；每个Z独立地是氧原子、硫原子或非交联；每个R1独立地是具有1至30个碳原子的线性、支链或环烷基基团，具有6至30个碳原子并且可选地具有取代基的芳基，具有2至30个碳原子并且可选地具有取代基的烯基基团，具有1至30个碳原子并且可选地具有取代基的烷氧基团，卤素原子，硝基基团，氨基，羧基，硫醇基，羟基，或氢氧基的氢原子被乙烯基苄基团取代的基团，其中烷基基团，芳基，烯基基团或烷氧基团可选地含有醚键，酮键或酯键；每个R1A独立地是甲基基团或氢原子；每个k独立地是0至2的整数，前提是所有k基团不同时为0；m是1至3的整数；每个n独立地是0至5的整数；每个p独立地是0或1。