[(Z)-[2,2,2-trifluoro-1-[4-[3-[4-[(3E)-6-methyl-1,1-dioxo-8,10-di(propan-2-yl)-5,6-dihydro-2,1lambda6,3-benzoxathiazocin-4-yl]phenoxy]propoxy]phenyl]ethylidene]amino] 2-ethyl-4,6-di(propan-2-yl)benzenesulfonate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: [(Z)-[2,2,2-trifluoro-1-[4-[3-[4-[(3E)-6-methyl-1,1-dioxo-8,10-di(propan-2-yl)-5,6-dihydro-2,1lambda6,3-benzoxathiazocin-4-yl]phenoxy]propoxy]phenyl]ethylidene]amino] 2-ethyl-4,6-di(propan-2-yl)benzenesulfonate
• 英文别名: [(Z)-[2,2,2-trifluoro-1-[4-[3-[4-[(3E)-6-methyl-1,1-dioxo-8,10-di(propan-2-yl)-5,6-dihydro-2,1λ6,3-benzoxathiazocin-4-yl]phenoxy]propoxy]phenyl]ethylidene]amino] 2-ethyl-4,6-di(propan-2-yl)benzenesulfonate
• 化学式: C₄₇H₅₇F₃N₂O₈S₂
• 分子量: 899.1
• InChiKey: JGRVOIHXNOFHAK-RMNSWAJJSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  13.3
• 重原子数：
  62
• 可旋转键数：
  16
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.45
• 拓扑面积：
  147
• 氢给体数：
  0
• 氢受体数：
  13

文献信息

• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20140248556A1

  公开（公告）日：2014-09-04

  A pattern forming method including: (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) having a repeating unit having a group generating a polar group upon being decomposed by the action of an acid, and a repeating unit having an aromatic group, a compound (B) generating an acid upon irradiation with actinic rays or radiation, and a solvent (C); (ii) exposing the film; and (iii) developing the exposed film using a developer including an organic solvent to form a negative tone pattern, wherein the resin (A) is a resin having a repeating unit having a naphthyl group, and the like, and/or the actinic ray-sensitive or radiation-sensitive resin composition contains a compound (D) having a naphthalene ring, and the like.
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20150253662A1

  公开（公告）日：2015-09-10

  According to an exemplary embodiment of the present invention, there is provided an actinic ray-sensitive or radiation-sensitive resin composition includes an aromatic group and a resin (A) that may include (i) a repeating unit having a group capable of decomposing by the action of an acid to generate a polar group and (ii) a repeating unit having a polar group other than a phenolic hydroxyl group, wherein the total content of the repeating units (i) and (ii) is 51 mol % or more based on the entire repeating units in the resin (A).
• US9128376B2
  申请人：——

  公开号：US9128376B2

  公开（公告）日：2015-09-08