[4-(Hydroxymethyl)phenyl]methyl 4-cyano-4-methylpentanoate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: [4-(Hydroxymethyl)phenyl]methyl 4-cyano-4-methylpentanoate
• 英文别名: [4-(hydroxymethyl)phenyl]methyl 4-cyano-4-methylpentanoate
• 化学式: C₁₅H₁₉NO₃
• 分子量: 261.32
• InChiKey: NXHSKEJQSBTNBU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  19
• 可旋转键数：
  7
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.47
• 拓扑面积：
  70.3
• 氢给体数：
  1
• 氢受体数：
  4

文献信息

• NEUTRAL LAYER POLYMER COMPOSITION FOR DIRECTED SELF ASSEMBLY AND PROCESSES THEREOF
  申请人：AZ Electronic Materials (Luxembourg) S.à.r.l.

  公开号：EP2859023B1

  公开（公告）日：2017-07-19
• RAPID CROSS-LINKABLE NEUTRAL UNDERLAYERS FOR CONTACT HOLE SELF-ASSEMBLY OF POLYSTYRENE-B- POLY(METHYL METHACRYLATE) DIBLOCK COPOLYMERS AND THEIR FORMULATION THEREOF
  申请人：Merck Patent GmbH

  公开号：US20220002575A1

  公开（公告）日：2022-01-06

  The present invention relates to a random copolymer comprising repeat units of structure (I), (II), (III), and (IV). The invention also pertains to a neutral layer composition comprised of said random copolymer and also pertains to the use of said neutral layer composition to make a crosslinked neutral layer film on a substrate, which can enable self-assembly of a film of a block copolymer overlying said crosslinked neutral layer, wherein said block copolymer contains etch resistant and etchable block, and whose self-assembled pattern is used, through etching, to create either an array of contact holes or posts in said substrate.
• US8835581B2
  申请人：——

  公开号：US8835581B2

  公开（公告）日：2014-09-16
• US9574104B1
  申请人：——

  公开号：US9574104B1

  公开（公告）日：2017-02-21
• [EN] COMPOSITIONS AND PROCESSES FOR SELF-ASSEMBLY OF BLOCK COPOLYMERS<br/>[FR] COMPOSITIONS ET PROCESSUS D'AUTO-ASSEMBLAGE DE COPOLYMÈRES À BLOCS
  申请人：AZ ELECTRONIC MAT (LUXEMBOURG) S À R L

  公开号：WO2017064199A1

  公开（公告）日：2017-04-20

  The present invention relates to novel copolymers containing cross-linkable and graft- able moieties, novel compositions comprised of these novel copolymers and a solvent, and methods for using these novel compositions to form neutral layer films which are both cross-linked and grafted on the substrate which are used in processes for aligning microdomains of block copolymers (BCP) on this neutral layer coated substrate such as self-assembly and directed self-assembly. The novel compositions are comprised of at least one novel random copolymer comprised of least one unit of structure (1), at least one unit of structure (2) at least one unit of structure (3) one ∼∼∼H end group and one end group having structure (1'); where R1 is selected from the group consisting of a C1-C8 alkyl, C2-C8 fluoroalkyl, C4- C-8 partially fluorinated alkyl moiety, C4-C8 cycloalkyl, C4-C8 cyclofluoroalkyl, C4-C8 partially fluorinated cycloalkyl, and a C2-C8 hydroxyalkyl; R2, R3 and R5 are independently selected from a group consisting of H, C1-C4 alkyl, CF3 and F; R4 is selected from the group consisting of H, C1-C8 alkyl, C1-C8 partially fluorinated alkyl moiety and d-C-e fluoroalkyl, n ranges from 1 to 5, R6 is selected from the group consisting of H, F, d-C-e alkyl and a d-C-e fluoroalkyl and m ranges from 1 to 3, and n' ranges from 1 to 5, and n" ranges from 1 to 5, n'" ranges from 1 to 5, R7 is a C1 to C8 alkyl and X is -CN, or an alkyloxycarbonyl moiety R8-0-(C=0)- where Re is a C1 to C8 alkyl and ∼∼∼ represent the attachment point of the end group to the polymer. The novel polymers, compositions and processes are useful for fabrication of electronic devices.