N-Chloro-2,6-diethylbenzenamine | 71477-82-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: N-Chloro-2,6-diethylbenzenamine
• 英文别名: N-chloro-2,6-diethylaniline
• CAS: 71477-82-2；152433-75-5
• 化学式: C₁₀H₁₄ClN
• 分子量: 183.68
• InChiKey: ITDHHRGCSPXWJP-UHFFFAOYSA-N

物化性质

• 熔点：
  175-179 °C (decomp)

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  12
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  12
• 氢给体数：
  1
• 氢受体数：
  1

安全信息

• 海关编码：
  2921420090

文献信息

• Chemical mechanical polishing pad
  申请人：Rohm and Haas Electronic Materials CMP Holdings, Inc.

  公开号：US10875144B2

  公开（公告）日：2020-12-29

  The present invention provides methods of CMP polishing a metal surface, such as a copper or tungsten containing metal surface in a semiconductor wafer, the methods comprising CMP polishing the substrate with a CMP polishing pad that has a top polishing surface in a polishing layer which is the reaction product of an isocyanate terminated urethane prepolymer and a curative component comprising a polyol curative having a number average molecular weight of 6000 to 15,000, and having an average of 5 to 7 hydroxyl groups per molecule and a polyfunctional aromatic amine curative, wherein the polishing layer would if unfilled have a water uptake of 4 to 8 wt. % after one week of soaking in deionized (DI) water at room temperature. The methods form coplanar metal and dielectric or oxide layer surfaces with low defectivity and a minimized degree of dishing.

  本发明提供了CMP抛光金属表面的方法，例如半导体晶片中的含铜或钨的金属表面，该方法包括用CMP抛光垫对基片进行CMP抛光，该CMP抛光垫在抛光层中具有顶部抛光表面，该抛光层是异氰酸酯端聚氨酯预聚物和固化剂组分的反应产物，固化剂组分包括平均分子量为6000至15、000，且每个分子平均有 5 至 7 个羟基，以及一种多官能芳香胺固化剂。在室温下的去离子水中浸泡一周后，抛光层的吸水率为 4 至 8 wt.这些方法可形成共面金属和介电层或氧化层表面，具有低缺陷率和最小的凹陷程度。
• US6548608B2
  申请人：——

  公开号：US6548608B2

  公开（公告）日：2003-04-15
• [EN] MODIFIED URETHANE COMPOSITIONS CONTAINING ADDUCTS OF O-PHTHALIC ANHYDRIDE ESTER POLYOLS<br/>[FR] COMPOSITIONS URETHANE MODIFIEES CONTENANT DES ADDUITS DE POLYOLS D'ESTER D'ANHYDRIDE DOLLAR I(O)-PHTALIQUE
  申请人：UNIROYAL CHEM CO INC

  公开号：WO2002004536A2

  公开（公告）日：2002-01-17

  A polyrethane elastomer is disclosed that comprises: the reaction product of a prepolymer comprising: the reaction product of: (1) an aromatic ester polyol having the structure (I): wherein: R1 is a divalent radical selected from the group consisting of: (a) alkylene radicals of from 2 to 6 carbon atoms, and (b) radicals of the formula: -(R2O)n-R2- wherein R2 is an alkylene radial of 2 or 3 carbon atoms, n is an integer of from 1 to 3, and m is an integer of form 1 to 15; and (2) a diisocyanate; with a chain extender selected from the group consisting of water, aliphatic doils, aromatic diamines, and mixtures thereof.