N-hydroxy-5-norbornene-2,3-dicarboximide | 92619-32-4

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 异吲哚及其衍生物
• 英文名称: N-hydroxy-5-norbornene-2,3-dicarboximide
• 英文别名: 4,7-Methano-1H-isoindole-1,3(2H)-dione, hexahydro-2-hydroxy-；4-hydroxy-4-azatricyclo[5.2.1.02,6]decane-3,5-dione
• CAS: 92619-32-4
• 化学式: C₉H₁₁NO₃
• 分子量: 181.191
• InChiKey: NQCGHVBLTCGHIY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.4
• 重原子数：
  13
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.78
• 拓扑面积：
  57.6
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  4-(2-carboxyethoxy)-3-benzenesulfonyl-2-oxo-1,2,5-oxadiazole 、 N-hydroxy-5-norbornene-2,3-dicarboximide 在 N,N'-二环己基碳二亚胺 作用下， 以 四氢呋喃 为溶剂， 反应 20.0h， 生成 N-{2-[(3-{[5-oxido-4-(phenylsulphonyl)-1,2,5-oxadiazol-3-yl]-oxy}-propionyl)-oxy]}-5-norbornene-2,3-dicarboximide
  参考文献：
  名称：

  New addition salts of angiotensin-converting enzyme inhibitors with no donor acids, a process for their preparation and pharmaceutical compositions containing them

  摘要：

  式(I)的化合物：(A)m·(B)n(I)，其中A代表至少含有一个盐形成碱性功能的抑制血管紧张素转化酶的化合物，B代表至少含有一个盐形成酸性功能和至少一个NO供体基团的化合物，m代表已转化为盐的B的酸性功能的数量，n代表已转化为盐的A的碱性功能的数量，A和B之间的键或键为离子型。含有这些化合物的药品对治疗心血管病理有用。

  公开号：

  US20090082393A1

文献信息

• CARBAZOLE DERIVATIVES AS AGENTS AGAINST MULTI-DRUG RESISTANCE
  申请人：CIBA-GEIGY AG

  公开号：EP0763040A1

  公开（公告）日：1997-03-19
• POLYCYCLIC LACTAM DERIVATIVES FOR SENSITIZING MULTIDRUG-RESISTANT CELLS TO ANTITUMOUR AGENTS
  申请人：CIBA-GEIGY AG

  公开号：EP0763042A1

  公开（公告）日：1997-03-19
• INDOLOCARBAZOLE DERIVATIVES FOR SENSITIZING MULTIDRUG-RESISTANT CELLS TO ANTITUMOR AGENTS
  申请人：CIBA-GEIGY AG

  公开号：EP0763041A1

  公开（公告）日：1997-03-19
• PHOTORESIST TOPCOAT FOR A PHOTOLITHOGRAPHIC PROCESS
  申请人：Allen Robert David

  公开号：US20080227028A1

  公开（公告）日：2008-09-18

  A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas T m R3 where m is equal to 8, 10 or 12 and Q n M n R1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.
• PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
  申请人：ROHM AND HAAS ELECTRONIC MATERIALS LLC

  公开号：US20220214616A1

  公开（公告）日：2022-07-07

  A photoresist composition, comprising a first polymer comprising a first repeating unit comprising an acid-labile group, and a second polymer comprising a repeating unit derived from one or more monomers of formula (4); a photoacid generator; and a solvent, wherein Z 1 , Z 2 , R 1 , R 2 , and L are as described herein, and P is a polymerizable group.