4-Methacryloyloxy-2-tert-butyl-phenol | 31480-95-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚酯
• 英文名称: 4-Methacryloyloxy-2-tert-butyl-phenol
• 英文别名: 3-(1,1-Dimethylethyl)-4-hydroxyphenyl 2-methyl-2-propenoate；(3-tert-butyl-4-hydroxyphenyl) 2-methylprop-2-enoate
• CAS: 31480-95-2
• 化学式: C₁₄H₁₈O₃
• 分子量: 234.295
• InChiKey: GZNVDSHKZWETDP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4
• 重原子数：
  17
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.36
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• Positive resist composition and pattern forming process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US10012902B2

  公开（公告）日：2018-07-03

  A non-chemically-amplified positive resist composition comprising a polymer comprising both recurring units derived from a sulfonium salt capable of generating a fluorinated acid and recurring units containing an amino group as a base resin exhibits a high resolution and a low edge roughness and forms a pattern of good profile after exposure and organic solvent development.

  一种非化学扩增的正抗蚀剂组合物，由一种聚合物组成，这种聚合物既包括从能生成氟化酸的锍盐中提取的递归单元，也包括作为基体树脂的含有氨基的递归单元，在曝光和有机溶剂显影后，该组合物具有高分辨率和低边缘粗糙度，并能形成轮廓良好的图案。
• POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20150064626A1

  公开（公告）日：2015-03-05

  A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and recurring units of tert-butyl or tert-amyl-substituted hydroxyphenyl methacrylate and having a weight average molecular weight of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.
• POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170242339A1

  公开（公告）日：2017-08-24

  A non-chemically-amplified positive resist composition comprising a polymer comprising both recurring units derived from a sulfonium salt capable of generating a fluorinated acid and recurring units containing an amino group as a base resin exhibits a high resolution and a low edge roughness and forms a pattern of good profile after exposure and organic solvent development.
• RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD
  申请人：JSR CORPORATION

  公开号：US20200117087A1

  公开（公告）日：2020-04-16

  A radiation-sensitive resin composition contains: a first polymer including a first structural unit that includes a phenolic hydroxy group, and a second structural unit that includes an acid-labile group; a second polymer including a fluorine atom, a silicon atom, or both, and including a third structural unit that includes an alkali-labile group; a first compound that generates upon an irradiation with a radioactive ray an acid capable of dissociating the acid-labile group within 1 minute under a temperature T X ° C. of no less than 80° C. and no greater than 130° C.; and a second compound that generates upon an irradiation with a radioactive ray a carboxylic acid, a sulfonic acid, or both, the carboxylic acid and the sulfonic acid each being not capable of substantially dissociating the acid-labile group within 1 minute under the temperature T X ° C.
• US9335632B2
  申请人：——

  公开号：US9335632B2

  公开（公告）日：2016-05-10