N,N'-Dicyclohexyl-N''-methyl-guanidine | 35168-16-2

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: N,N'-Dicyclohexyl-N''-methyl-guanidine
• 英文别名: N,N''-Dicyclohexyl-N''''-methyl-guanidine; hydrochloride；1,3-dicyclohexyl-2-methylguanidine
• CAS: 35168-16-2
• 化学式: C₁₄H₂₇N₃
• 分子量: 237.388
• InChiKey: LMYCTHOCZIDLPC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  17
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.93
• 拓扑面积：
  36.4
• 氢给体数：
  2
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  N,N'-二环己基碳二亚胺 、 甲胺 以 四氢呋喃 为溶剂， 生成 N,N'-Dicyclohexyl-N''-methyl-guanidine
  参考文献：
  名称：

  N，N'-二-邻甲苯基胍类似物，氟哌啶醇敏感的sigma受体的高亲和力配体的合成与构效关系。

  摘要：

  着眼于新型非典型抗精神病药的开发，我们研究了氟哌啶醇敏感的sigma受体的N，N'-二-邻甲苯基胍（DTG，3）及其同类物的结构亲和力关系。合成了许多DTG类似物，并在豚鼠脑膜匀浆的体外放射性配体置换实验中使用了高sigma特异性放射性配体[3H] -3和[3H]-（+）-3-（3-羟苯基）进行了评估。 -N-（1-丙基）哌啶和苯环利定（PCP）受体特异性化合物[3H] -N- [1-（2-噻吩基）-环己基]哌啶和[3H]-（+）-5-甲基-10 ，11-二氢-5H-二苯并[a，d]环庚烯-5，10-亚胺。N，N'-二芳基胍对sigma受体的亲和力随邻位取代基的体积比C2H5大而增加。疏水取代基通常优于类似位置的亲水取代基。此外，电子中性取代基优于强电子给体或吸电子基团。只要胍的至少一侧带有优选基团（例如2-CH 3 C 6 H 5），通常就可以保持与σ受体的显着结合。用某些饱和的碳环（例

  DOI：

  10.1021/jm00171a016

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME
  申请人：HIRANO Shuji

  公开号：US20120003590A1

  公开（公告）日：2012-01-05

  An actinic ray-sensitive or radiation-sensitive resin composition containing a resin having (A) a repeating unit represented by a specific formula (I) and (B) a repeating unit capable of generating an acid upon irradiation with an actinic ray or radiation.
• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN
  申请人：FUJIFILM CORPORATION

  公开号：US20140227636A1

  公开（公告）日：2014-08-14

  Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (Aa) containing at least one repeating unit (Aa1) derived from monomers of general formula (aa1-1) below and at least one repeating unit (Aa2) derived from monomers of general formula (aa2-1) below and comprising a resin (Ab) that when acted on by an acid, changes its alkali solubility.
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME
  申请人：FUJIFILM Corporation

  公开号：US20140295332A1

  公开（公告）日：2014-10-02

  An actinic ray-sensitive or radiation-sensitive resin composition, which is excellent in sensitivity, resolution, a pattern profile and a depth of focus (DOF), and, an actinic ray-sensitive or radiation-sensitive film and a pattern forming method, each using the same, are provided. The actinic ray-sensitive or radiation-sensitive resin composition includes a nitrogen-containing compound and a resin (Ab) capable of varying a polarity or an alkali solubility thereof by the action of an acid.
• US20140272692A1
  申请人：——

  公开号：US20140272692A1

  公开（公告）日：2014-09-18
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20150010857A1

  公开（公告）日：2015-01-08

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).