申请人:HOKKO CHEMICAL INDUSTRY CO., LTD
公开号:EP0202169A1
公开(公告)日:1986-11-20
As new compounds is provided a pyrazole derivative of the formula
wherein R1a, R1b and R1c are each a hydrogen atom, a halogen atom, a nitro group, an amino group, a (lower) alkyl group, a halo-(lower)alkyl group, a (lower)alkenyl group, a (lower)alkynyl group, a (lower)alkylcarbonylamino group, a (lower)alkoxycarbonylamino group, a mono-(lower) alkylaminocarbonylamino group or a di-(lower)alkylaminocarbonylamino group;
R2 is a hydrogen atom, a (lower)alkyl group, a (lower)alkenyl group, a (lower)alkynyl group, a (lower) alkoxy(lower)-alkyl group; a (lower)alkylthio(lower)alkyl group, a (lower)alkylcarbonyl(lower)alkyl group, a (lower) alkoxycarbonyl(lower)alkyl group, a (lower)alkylthiocarbonyl(lower) alkyl group, a cyano(lower)alkyl group, a (lower)alkylsulfonyl group, phenylsulfonyl group, a halogen-substituted phenylsulfonyl group or a (lower)alkyl-substituted phenylsulfonyl group, and
X and Y are the same or different and each are a halogen atom. The pyrazoles are useful as herbicidal agentand may be produced by a variety of processes.
作为新化合物,提供了一种吡唑衍生物,其式如下
其中 R1a、R1b 和 R1c 各为氢原子、卤素原子、硝基、氨基、(低级)烷基、卤代(低级)烷基、(低级)烯基、(低级)炔基、(低级)烷基羰基氨基、(低级)烷氧基羰基氨基、单(低级)烷基氨基羰基氨基或二(低级)烷基氨基羰基氨基;
R2 是氢原子、(低级)烷基、(低级)烯基、(低级)炔基、(低级)烷氧基(低级)烷基;(低级)烷硫基(低级)烷基、(低级)烷羰基(低级)烷基、(低级)烷氧羰基(低级)烷基、(低级)烷硫基(低级)烷基、氰基(低级)烷基、(低级)烷磺酰基、苯磺酰基、卤素取代的苯磺酰基或(低级)烷基取代的苯磺酰基,以及
X 和 Y 相同或不同,且各自为卤素原子。吡唑可用作除草剂,并可通过多种工艺生产。