(3,4-Dihydroxyphenyl) prop-2-enoate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚酯
• 英文名称: (3,4-Dihydroxyphenyl) prop-2-enoate
• 英文别名: (3,4-dihydroxyphenyl) prop-2-enoate
• 化学式: C₉H₈O₄
• 分子量: 180.16
• InChiKey: QBQHCMOJUOFMJV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  13
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  66.8
• 氢给体数：
  2
• 氢受体数：
  4

文献信息

• ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：EP3521926B1

  公开（公告）日：2021-04-21
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20190219921A1

  公开（公告）日：2019-07-18

  Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin including a repeating unit (a) represented by Formula (1); (B) a compound that generates an acid by irradiation with actinic rays or radiation; and (C) an organic solvent. A concentration of solid contents of the actinic ray-sensitive or radiation-sensitive resin composition is 4 mass % or less. (in the formula, R 11 and R 12 each independently represent a hydrogen atom, a halogen atom, or a monovalent organic group. R 13 represents a hydrogen atom, a halogen atom, or a monovalent organic group or is a single bond or an alkylene group, and is bonded to L or Ar in the formula to form a ring. L represents a single bond or a divalent linking group. Ar represents an aromatic ring group. n represents an integer of 2 or more.)