Benzoic acid;copper

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Benzoic acid;copper
• 化学式: C14H12CuO4
• 分子量: 307.79
• InChiKey: KFWRJUPPMBMMMW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.77
• 重原子数：
  19
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  74.6
• 氢给体数：
  2
• 氢受体数：
  4

文献信息

• SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160334702A1

  公开（公告）日：2016-11-17

  A salt represented by formula (I): wherein Q 1 and Q 2 independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group, R 1 and R 2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C 1 to C 6 perfluoroalkyl group, z represents an integer of 0 to 6, X 1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R 1 )(R 2 ) or C(Q 1 )(Q 2 ), A 1 represents a C 4 to C 24 hydrocarbon group having a C 4 to C 18 divalent alicyclic hydrocarbon moiety, A 2 represents a C 2 to C 12 divalent hydrocarbon group, R 3 and R 4 independently represent a hydrogen atom or a C 1 to C 6 monovalent saturated hydrocarbon group, R 5 represents a hydrogen atom, a fluorine atom, or a C 1 to C 6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z + represents an organic cation.

  公式(I)表示的盐，其中Q1和Q2独立地代表一个氟原子或一个C1至C6的过氟烷基团，R1和R2每次出现独立地代表一个氢原子、一个氟原子或一个C1至C6的过氟烷基团，z代表0到6的整数，X1代表*—CO—O—，*—O—CO—或—O—，*代表与C(R1)(R2)或C(Q1)(Q2)的连接位置，A1代表具有C4至C18二价脂环烃基团的C4至C24的烃基团，A2代表C2至C12的二价烃基团，R3和R4独立地代表一个氢原子或一个C1至C6的一价饱和烃基团，R5代表一个氢原子、一个氟原子或一个C1至C6的烷基团，其中氢原子可以被氟原子替换，而Z+代表一个有机阳离子。
• PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：ICHIKAWA Koji

  公开号：US20120270153A1

  公开（公告）日：2012-10-25

  A photoresist composition comprising (A) a resin which has an acid-labile group-containing structural unit and a lactone ring-containing structural unit, and (B) a salt represented by formula (I): wherein Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, L 1 represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, provided that L 1 is not a single bond when n is 0, R 1 represents a hydroxy group or a hydroxy group protected by a protecting group, and Z + represents an organic cation.

  一种包括(A)具有含酸敏感基团结构单元和含内酯环结构单元的树脂，以及(B)由式(I)表示的盐的光刻胶组合物：其中Q1和Q2分别独立表示氟原子或C1-C6全氟烷基基团，n表示0或1，L1表示单键或C1-C10脂肪二基基团，其中亚甲基基团可被氧原子或羰基取代，但当n为0时，L1不是单键，R1表示羟基或被保护基团保护的羟基，Z+表示有机阳离子。
• Salt, acid generator, resin, resist composition and method for producing resist pattern
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US10599033B2

  公开（公告）日：2020-03-24

  A salt represented by formula (I): wherein Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, R1 and R2 in each occurrence independently represent a hydrogen atom, a fluorine atom or a C1 to C6 perfluoroalkyl group, z represents an integer of 0 to 6, X1 represents *—CO—O—, *—O—CO— or —O—, * represents a binding position to C(R1)(R2) or C(Q1)(Q2), A1 represents a C4 to C24 hydrocarbon group having a C4 to C18 divalent alicyclic hydrocarbon moiety, A2 represents a C2 to C12 divalent hydrocarbon group, R3 and R4 independently represent a hydrogen atom or a C1 to C6 monovalent saturated hydrocarbon group, R5 represents a hydrogen atom, a fluorine atom, or a C1 to C6 alkyl group where a hydrogen atom may be replaced by a fluorine atom, and Z+ represents an organic cation.

  式 (I) 所代表的盐： 其中 Q1 和 Q2 独立地代表氟原子或 C1 至 C6 全氟烷基，R1 和 R2 在每次出现时独立地代表氢原子、氟原子或 C1 至 C6 全氟烷基，z 代表 0 至 6 的整数，X1 代表 *-CO-O-、*-O-CO- 或 -O-，* 代表与 C(R1)(R2)或 C(Q1)(Q2)的结合位置、A1 代表具有 C4 至 C18 二价脂环烃分子的 C4 至 C24 烃基，A2 代表 C2 至 C12 二价烃基，R3 和 R4 独立地代表氢原子或 C1 至 C6 单价饱和烃基，R5 代表氢原子、氟原子或 C1 至 C6 烷基，其中氢原子可被氟原子取代，Z+ 代表有机阳离子。
• COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20150064622A1

  公开（公告）日：2015-03-05

  A compound represented by formula (I): wherein R 1 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group which may have a halogen atom; R 2 and R 3 each independently represent a hydrogen atom or a C1-C6 monovalent saturated hydrocarbon group, and R 4 represents a C1-C6 monovalent saturated linear hydrocarbon group, a C3-C6 monovalent saturated branched hydrocarbon group, a C5-C12 monovalent alicyclic hydrocarbon group or a C5-C12 monovalent alicyclic hydrocarbon-containing group, or R 3 and R 4 represent a C2-C6 heterocyclic ring together with an oxygen atom and a carbon atom; A 1 represents a single bond, or *-A 2 -X 1 -(A 3 -X 2 ) a — where A 2 and A 3 each independently represent a C1-C6 alkanediyl group, X 1 and X 2 each independently represent an oxygen atom, a carbonyloxy group or an oxycarbonyl group, and “a” represents 0 or 1; A 4 represents a C1-C6 alkanediyl group; Ad represents a divalent adamantanediyl group.
• RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20150147695A1

  公开（公告）日：2015-05-28

  A resin comprising: a structural unit which has, at a side chain, a carbonyl group and a thiolactone ring-containing amino group where the thiolactone ring may have a substituent, and a structural unit having an acid-labile group.