Disclosed herein are a composition for forming an organic insulating film and an organic insulating film formed from the composition. The composition comprises an insulating polymer having a maleimide structure, a crosslinking agent and a photoacid generator so as to form a crosslinked structure. The organic insulating film has excellent chemical resistance to organic solvents used in a subsequent photolithographic process and improves the electrical properties of transistors.
本文公开了一种用于形成有机绝缘膜的组合物以及由该组合物形成的有机绝缘膜。该组合物由具有马来
酰亚胺结构的绝缘聚合物、
交联剂和光酸发生器组成,从而形成交联结构。有机绝缘膜对后续光刻工艺中使用的有机溶剂具有优异的耐
化学性,并能改善晶体管的电气性能。