[(E)-[cyano-(3,4-dimethylphenyl)methylidene]amino] methanesulfonate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: [(E)-[cyano-(3,4-dimethylphenyl)methylidene]amino] methanesulfonate
• 化学式: C₁₁H₁₂N₂O₃S
• 分子量: 252.29
• InChiKey: YBCWGWZDFPFTGM-QBFSEMIESA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  17
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.27
• 拓扑面积：
  87.9
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• MULTI-STEP PROCESS FOR NO PRODUCTION
  申请人：BSN medical GmbH

  公开号：US20180116920A1

  公开（公告）日：2018-05-03

  The present invention relates to a multi-step process for the production of nitrogen monoxide (NO) from a pH-labile NO donor in the presence of at least one antioxidant. The invention also relates to a device for implementation of said process and the use of said device for the treatment of diseases. Moreover, the invention relates to a cosmetic process using said process or said device.

  本发明涉及一种多步骤过程，用于在存在至少一种抗氧化剂的情况下，从pH不稳定的NO供体中生产一氧化氮（NO）。该发明还涉及用于实施该过程的装置以及利用该装置用于治疗疾病的方法。此外，该发明还涉及使用该过程或该装置的化妆过程。
• Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity
  申请人：——

  公开号：US20040013974A1

  公开（公告）日：2004-01-22

  The invention describes the use of oxime alkyl sulfonate compounds of formula 1 1 R 0 is either an R 1 —X group or R 2 ; X is a direct bond, an oxygen atom or a sulfur atom; R 1 is hydrogen, C 1 -C 4 alkyl or a phenyl group which is unsubstituted or substituted by a substituent selected from the group consisting of chloro, bromo, C 1 -C 4 alkyl and C 1 -C 4 -alkyloxy; R 2 is hydrogen or C 1 -C 4 alkyl; and R 3 is straight-chain or branched C 1 -C 12 alkyl which is unsubstituted or substituted by one or more than one halogen atom; as photosensitive add generator in a chemically amplified photoresist which is developable in alkaline medium and which is sensitive to radiation at a wavelength of 340 to 390 nanometers and correspondingly composed positive and negative photoresists for the above-mentioned wavelength range.

  该发明描述了氧肟烷磺酸酯化合物的使用，其化学式为11R0，其中R0是R1—X基团或R2；X是一个直接键，一个氧原子或一个硫原子；R1是氢，C1-C4烷基或苯基，未取代或取代，取代基选择自氯、溴、C1-C4烷基和C1-C4-烷氧基组成的组；R2是氢或C1-C4烷基；R3是直链或支链的C1-C12烷基，未取代或取代，取代一个或多个卤素原子；作为化学增感光阻剂中的光敏添加剂，该增感光阻剂可在碱性介质中显影，对波长为340至390纳米的辐射敏感，相应地组成了上述波长范围内的正负光刻胶。
• CHANGING SURFACE PROPERTIES BY FUNCTIONALIZED NANOPARTICLES
  申请人：Giesenberg Thomas

  公开号：US20100178512A1

  公开（公告）日：2010-07-15

  A process for modifying the surface of an inorganic or organic substrate with strongly adherent nanoparticles is described, providing to the surface modified substrate durable effects like hydrophobicity, hydrophilicity, electrical conductivity, magnetic properties, flame retardance, color, adhesion, roughness, scratch resistance, UV-absorbance, antimicrobial properties, antifouling properties, antiprotein properties, antistatic properties, antifog properties, release properties. In this process, an optional first step a) a low-temperature plasma, ozonization, high energy irradiation, corona discharge or a flame is caused to act on the inorganic or organic substrate, and in a second step b) one or more defined nanoparticles or mixtures of defined nanoparticles with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied, preferably at normal pressure, to the inorganic or organic substrate. In a third step c) suitable methods are applied to dry or cure those afore-mentioned substances and, optionally, in a fourth step d) a further coating is applied on the substrate so pretreated.

  本文描述了一种用强附着力纳米颗粒改性无机或有机基底表面的方法，使表面改性后的基底具有耐久性效果，如疏水性、亲水性、电导性、磁性、防火性、颜色、附着力、粗糙度、抗刮擦性、UV吸收性、抗菌性、防污性、抗蛋白质性、抗静电性、防雾性和释放性。在此过程中，第一步（可选）是在无机或有机基底上施加低温等离子体、臭氧化、高能辐射、电晕放电或火焰，第二步（b）是将一个或多个定义的纳米颗粒或定义的纳米颗粒与至少一个乙烯基未饱和基团的单体，或上述物质的溶液、悬浮液或乳液，应用于无机或有机基底上，最好是在常压下进行。第三步（c）是应用适当的方法干燥或固化上述物质，可选地，在第四步（d）中在预处理的基底上施加进一步的涂层。
• Process for the Photoactivation and use of a Catalyst by an Inverted Two-Stage Procedure
  申请人：Benkhoff Johannes

  公开号：US20070249484A1

  公开（公告）日：2007-10-25

  The invention pertains to a process for the application of a specific photolatent catalyst (a) wherein a composition of matter, comprising said catalyst, is subjected to irradiation before being further processed.

  本发明涉及一种特定光潜催化剂（a）的应用过程，其中包含该催化剂的物质组成被辐照后再进行进一步加工。
• Thermisch härtbare Lackzusammensetzung
  申请人：Ciba Specialty Chemicals Holding Inc.

  公开号：EP1243632A1

  公开（公告）日：2002-09-25

  Säurekatalysiert vernetzbare Lackzusammensetzung enthaltend mindestens einen mittels Einwirkung einer Säure vernetzbaren Lackbestandteil; mindestens einen thermisch latenten Säurekatalysator oder einen photolatenten Säurekatalysator oder freie Säure; und mindestens eine photolatente Base.

  酸催化可交联涂料组合物，包含至少一种可在酸作用下交联的涂料成分；至少一种热潜伏酸催化剂或光惰性酸催化剂或游离酸；以及至少一种光惰性碱。