[Benzenesulfonyl(diazo)methyl]sulfonylbenzene;1-[diazo-(4-methylphenyl)sulfonylmethyl]sulfonyl-4-methylbenzene

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: [Benzenesulfonyl(diazo)methyl]sulfonylbenzene;1-[diazo-(4-methylphenyl)sulfonylmethyl]sulfonyl-4-methylbenzene
• 英文别名: [benzenesulfonyl(diazo)methyl]sulfonylbenzene;1-[diazo-(4-methylphenyl)sulfonylmethyl]sulfonyl-4-methylbenzene
• 化学式: C28H24N4O8S4
• 分子量: 672.8
• InChiKey: ZTUYZAJQKOENLH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.66
• 重原子数：
  44
• 可旋转键数：
  8
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.07
• 拓扑面积：
  174
• 氢给体数：
  0
• 氢受体数：
  10

文献信息

• Photosensitive resin composition, photosensitive dry film, and pattern forming process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US11187982B2

  公开（公告）日：2021-11-30

  A photosensitive resin composition comprising (A) a silicone resin containing an epoxy and/or phenolic hydroxyl group, (B) a photoacid generator, and (C) a cure promoter selected from diazabicycloundecene, diazabicyclononene, an organic salt of diazabicycloundecene derivative, and an organic salt of diazabicyclononene derivative is shelf stable. A photosensitive resin coating obtained therefrom may be processed to form a fine size pattern. The resin coating has improved film properties including chemical resistance, adhesion to substrates, mechanical properties, electric insulation, and copper migration resistance, and is thus fully reliable as an insulating protective film.

  一种光敏树脂组合物由以下部分组成：(A) 含环氧基和/或酚醛羟基的硅树脂；(B) 光酸发生器；(C) 选自二氮杂双环庚烯、二氮杂双环壬烯、二氮杂双环庚烯衍生物的有机盐、二氮杂双环壬烯衍生物的有机盐的固化促进剂，具有货架稳定性。由此获得的光敏树脂涂层经加工后可形成细小的图案。这种树脂涂层具有更好的薄膜性能，包括耐化学性、与基材的粘附性、机械性能、电绝缘性和抗铜迁移性，因此完全可以用作绝缘保护膜。
• PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20200117089A1

  公开（公告）日：2020-04-16

  A photosensitive resin composition comprising (A) a silicone resin containing an epoxy and/or phenolic hydroxyl group, (B) a photoacid generator, and (C) a cure promoter selected from diazabicycloundecene, diazabicyclononene, an organic salt of diazabicycloundecene derivative, and an organic salt of diazabicyclononene derivative is shelf stable. A photosensitive resin coating obtained therefrom may be processed to form a fine size pattern. The resin coating has improved film properties including chemical resistance, adhesion to substrates, mechanical properties, electric insulation, and copper migration resistance, and is thus fully reliable as an insulating protective film.