COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING AMORPHOUS FILM, MATERIAL FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, COMPOSTION FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD
申请人:Mitsubishi Gas Chemical Company, Inc.
公开号:EP3348542A1
公开(公告)日:2018-07-18
The present invention employs a compound represented by the following formula (1) and/or a resin comprising the compound as a constituent:
wherein R1 is a 2n-valent group of 1 to 60 carbon atoms or a single bond; R2 to R5 are each independently a linear, branched, or cyclic alkyl group of 1 to 10 carbon atoms, an aryl group of 6 to 10 carbon atoms, an alkenyl group of 2 to 10 carbon atoms, an alkoxy group of 1 to 30 carbon atoms, a halogen atom, a thiol group, a hydroxy group, or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group, provided that at least one selected from R2 to R5 is a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group; m2 and m3 are each independently an integer of 0 to 8; m4 and m5 are each independently an integer of 0 to 9, provided that m2, m3, m4, and m5 are not 0 at the same time; n is an integer of 1 to 4; and p2 to p5 are each independently an integer of 0 to 2.
本发明采用了下式(1)所代表的化合物和/或以该化合物为成分的树脂:
其中 R1 是 1 至 60 个碳原子的 2n 价基团或单键;R2 至 R5 各自独立地为 1 至 10 个碳原子的直链、支链或环状烷基、6 至 10 个碳原子的芳基、2 至 10 个碳原子的烯基、1 至 30 个碳原子的烷氧基、卤素原子、硫醇基、羟基或羟基的氢原子被酸离解基团取代的基团,条件是从 R2 至 R5 中至少选取一个为羟基的氢原子被酸离解基团取代的基团;m2和m3各自独立地为0至8的整数;m4和m5各自独立地为0至9的整数,条件是m2、m3、m4和m5不同时为0;n为1至4的整数;以及p2至p5各自独立地为0至2的整数。