5-Hydroxy-2-(4-hydroxybenzoyl)benzoic acid

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 5-Hydroxy-2-(4-hydroxybenzoyl)benzoic acid
• 化学式: C₁₄H₁₀O₅
• 分子量: 258.23
• InChiKey: LRSZBMSRHDNAGN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.1
• 重原子数：
  19
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  94.8
• 氢给体数：
  3
• 氢受体数：
  5

文献信息

• PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE
  申请人：HIKITA Masanori

  公开号：US20100080963A1

  公开（公告）日：2010-04-01

  A polymer compound is provided which is excellent in heat resistance and insulating property, and a photosensitive resin composition is provided which includes the polymer compound, and may form a cured pattern or a cured film excellent in pattern forming property, resolution, heat resistance and insulating property. Also, a method for forming a cured pattern excellent in pattern forming property, resolution, heat resistance and insulating property using the photosensitive resin composition, and an electronic device having high reliance for a semiconductor device or for a display device are provided. The photosensitive resin composition includes a polymer compound obtained by reacting a monomer represented by Formula (1) and a monomer represented by Formula (2), and a photosensitizing agent.
• US4323710A
  申请人：——

  公开号：US4323710A

  公开（公告）日：1982-04-06
• US8173349B2
  申请人：——

  公开号：US8173349B2

  公开（公告）日：2012-05-08