COMPOUND, RESIN, COMPOSITION, AND FILM FORMING MATERIAL FOR LITHOGRAPHY USING THE SAME
申请人:Mitsubishi Gas Chemical Company, Inc.
公开号:US20210003921A1
公开(公告)日:2021-01-07
A compound represented by the following formula (0).
(In the above formula (0),
R
X
represents a 2n
A
-valent group having 1 to 70 carbon atoms or a single bond;
each R
1A
independently represents any of an alkyl group having 1 to 30 carbon atoms and optionally having a substituent, an aryl group having 6 to 30 carbon atoms and optionally having a substituent, a crosslinkable group having 2 to 30 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, a maleamic acid group having 4 to 30 carbon atoms and optionally having a substituent, a maleimide group having 4 to 30 carbon atoms and optionally having a substituent, a halogen atom, a nitro group, an amino group having 0 to 30 carbon atoms and optionally having a substituent, a carboxyl group, a thiol group and a hydroxy group, wherein, when R
1A
is any of the alkyl group, the aryl group, the crosslinkable group and the alkoxy group, at least one bond selected from the group consisting of an ether bond, a ketone bond and an ester bond is optionally contained, and at least one R
1A
is any of a maleamic acid group having 4 to 30 carbon atoms and optionally having a substituent and a maleimide group having 4 to 30 carbon atoms and optionally having a substituent;
X represents an oxygen atom or a sulfur atom, or is optionally not present;
each R independently represents any of a benzene ring, a naphthalene ring and an anthracene ring;
each m is independently an integer of 0 to 9, wherein at least one m is an integer of 1 to 9; and
n
A
is an integer of 1 to 4.)