3-(((4-((4-(Diethylamino)phenyl)(4-(ethyl(3-sulfobenzyl)amino)phenyl)methylene)cyclohexa-2,5-dien-1-ylidene)(ethyl)ammonio)methyl)benzenesulfonate | 25460-30-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 3-(((4-((4-(Diethylamino)phenyl)(4-(ethyl(3-sulfobenzyl)amino)phenyl)methylene)cyclohexa-2,5-dien-1-ylidene)(ethyl)ammonio)methyl)benzenesulfonate
• 英文别名: 3-[[4-[[4-(diethylamino)phenyl]-[4-[ethyl-[(3-sulfophenyl)methyl]azaniumylidene]cyclohexa-2,5-dien-1-ylidene]methyl]-N-ethylanilino]methyl]benzenesulfonate
• CAS: 25460-30-4
• 化学式: C41H45N3O6S2
• 分子量: 739.9
• InChiKey: BTWMAWYAYFSBNC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.8
• 重原子数：
  52
• 可旋转键数：
  13
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.24
• 拓扑面积：
  138
• 氢给体数：
  1
• 氢受体数：
  8

文献信息

• Molecular Resist Compositions, Methods of Patterning Substrates Using the Compositions and Process Products Prepared Therefrom
  申请人：MCLELLAN Joseph M.

  公开号：US20090311484A1

  公开（公告）日：2009-12-17

  The present invention is directed to molecular resist compositions comprising an organic amine, methods of forming features on substrates using the molecular resists compositions and process products prepared therefrom.