2-(3-Methoxyphenyl)propane-2-thiol

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2-(3-Methoxyphenyl)propane-2-thiol
• 英文别名: 2-(3-methoxyphenyl)propane-2-thiol
• 化学式: C₁₀H₁₄OS
• 分子量: 182.28
• InChiKey: ODQZBIOYYSOENG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  12
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  10.2
• 氢给体数：
  1
• 氢受体数：
  2

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMATION METHOD, AND PRODUCTION METHOD FOR ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：EP3885378A1

  公开（公告）日：2021-09-29

  An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition, in which the cross-sectional shape of a pattern thus formed has excellent rectangularity and a dimensional variation of the line width of the pattern thus formed hardly occurs even over time after preparation. Furthermore, another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each using the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a polarity that increases through decomposition by an action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and a halogen-based solvent, in which a content of the halogen-based solvent is from 1 ppb by mass to 50 ppm by mass with respect to a total mass of the composition.

  本发明的一个目的是提供一种对辐射线敏感或辐射敏感的树脂组合物，在这种组合物中，由此形成的图案的横截面形状具有极佳的矩形性，而且由此形成的图案的线宽即使在制备后一段时间内也几乎不会发生尺寸变化。此外，本发明的另一个目的是提供一种抗蚀剂薄膜、一种图案形成方法和一种制造电子设备的方法，每种方法都使用了对放 射线敏感或对辐射敏感的树脂组合物。 本发明一个实施例中的对放 射线敏感或对辐射敏感的树脂组合物包括极性在酸的作用下分解而增加的树脂、在放 射线或辐射照射下产生酸的化合物和卤素基溶剂，其中卤素基溶剂的含量相对于组合物的总 质量为 1 ppb 至 50 ppm。
• Therapeutic compounds and uses thereof
  申请人：GENENTECH, INC.

  公开号：US10202354B2

  公开（公告）日：2019-02-12

  The present invention relates to compounds useful as inhibitors of one or more histone demethylses, such as KDM2b. The invention also provides pharmaceutically acceptable compositions comprising compounds of the present invention and methods of using said compositions in the treatment of various disorders.

  本发明涉及可作为一种或多种组蛋白去甲基化抑制剂（如 KDM2b）的化合物。本发明还提供了包含本发明化合物的药学上可接受的组合物，以及使用所述组合物治疗各种疾病的方法。
• Aryl dihydro-2H-benzo[b][1,4]oxazine sulfonamide and related compounds for use as agonists of RORγ and the treatment of disease
  申请人：Lycera Corporation

  公开号：US10611740B2

  公开（公告）日：2020-04-07

  The invention provides aryl dihydro-2H-benzo[b] [1,4]oxazine sulfonamide and related compounds, pharmaceutical compositions, methods of promoting RORy activity, methods of increasing the amount of IL-17 in a subject, and methods of treating cancer and other medical disorders using such compounds.

  本发明提供了芳基二氢-2H-苯并[b][1,4]恶嗪磺酰胺及相关化合物、药物组合物、促进 RORy 活性的方法、增加受试者体内 IL-17 数量的方法以及使用此类化合物治疗癌症和其他疾病的方法。
• Modulators of ATP-binding cassette transporters
  申请人：Vertex Pharmaceuticals Incorporated

  公开号：US10626111B2

  公开（公告）日：2020-04-21

  Compounds of the present invention, and pharmaceutically acceptable compositions thereof, are useful as modulators of ATP-Binding Cassette (“ABC”) transporters or fragments thereof, including Cystic Fibrosis Transmembrane Conductance Regulator (“CFTC”). The present invention also relates to methods of treating ABC transporter mediated diseases using compounds of the present invention.

  本发明的化合物及其药学上可接受的组合物可用作 ATP 结合盒（"ABC"）转运体或其片段（包括囊性纤维化跨膜传导调节剂（"CFTC"））的调节剂。本发明还涉及使用本发明化合物治疗 ABC 转运体介导的疾病的方法。
• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN
  申请人：FUJIFILM Corporation

  公开号：EP2721446B1

  公开（公告）日：2017-11-22