2-Ethyl-1-methyl-4-methylsulfanylbenzene

• 分子结构分类: 有机化合物 - 有机硫化合物 - 硫醚类
• 英文名称: 2-Ethyl-1-methyl-4-methylsulfanylbenzene
• 英文别名: 2-ethyl-1-methyl-4-methylsulfanylbenzene
• 化学式: C₁₀H₁₄S
• 分子量: 166.29
• InChiKey: PELDCZBHPQZWOA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  11
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  25.3
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP3951499A1

  公开（公告）日：2022-02-09

  The present invention is a negative photosensitive resin composition including: (A) an alkali-soluble resin containing at least one or more structures selected from a polyimide structure, a polybenzoxazole structure, a polyamide-imide structure, and a precursor structure thereof; (B) a crosslinkable polymer compound containing a structural unit represented by the following general formula (1) and having a group crosslinked with the component (A); (C) a compound that generates an acid by light; and (D) a heat crosslinking agent. An object of the present invention is to provide a negative photosensitive resin composition that enables formation of a fine pattern with high rectangularity and high resolution, has excellent mechanical characteristics even when cured at low temperatures, and furthermore, has no degradation in adhesive force between before and after a high temperature and high humidity test.

  本发明是一种负感光树脂组合物，包括：(A)一种碱溶性树脂，其中至少含有一种或多种结构，这些结构选自聚酰亚胺结构、聚苯并恶唑结构、聚酰胺-酰亚胺结构及其前体结构；(B)一种可交联聚合物化合物，其中含有由下式(1)表示的结构单元，并具有与组分(A)交联的基团；(C)一种在光照下生成酸的化合物；以及(D)一种热交联剂。本发明的目的是提供一种负感光树脂组合物，它能形成具有高矩形度和高分辨率的精细图案，即使在低温下固化也具有优异的机械特性，而且在高温高湿试验前后粘合力不会下降。