Perfluoro-4-methyl-1,3-dioxole: a new monomer for high-Tg amorphous fluoropolymers
摘要:
A 4-Chloro-5-trifluoromethyl-2,2,4-trifluoro-1,3-dioxolane (1) was synthesised by reaction of CF2(OF)(2) with CF3-CH=CFCl; the elimination of HCl from (1) in basic conditions led to the formation of dioxole perfluoro-4-methyl-1,3-dioxole (2). Both these synthetic steps gave the corresponding product in high yield.A new synthetic route for the preparation of CF3-CH=CFCl, starting from CF2ClBr and CH2=CF2, together with some examples of polymerisation products obtained by reaction of dioxole (2) with fluoroolefins are also reported. (C) 2003 Elsevier B.V. All rights reserved.
Copolymers of perfluoro-4-alkyl-1,3-dioxoles having the general formula
wherein Rf is a perfluoroalkylic radical having from 1 to 5 carbon atoms, allow to prepare copolymers with Tg higher than those of the copolymers containing the same molar percentage of fluorinated dioxoles of the art.
Perfluoro-4-methyl-1,3-dioxole: a new monomer for high-Tg amorphous fluoropolymers
作者:Antonio Russo、Walter Navarrini
DOI:10.1016/j.jfluchem.2003.10.009
日期:2004.1
A 4-Chloro-5-trifluoromethyl-2,2,4-trifluoro-1,3-dioxolane (1) was synthesised by reaction of CF2(OF)(2) with CF3-CH=CFCl; the elimination of HCl from (1) in basic conditions led to the formation of dioxole perfluoro-4-methyl-1,3-dioxole (2). Both these synthetic steps gave the corresponding product in high yield.A new synthetic route for the preparation of CF3-CH=CFCl, starting from CF2ClBr and CH2=CF2, together with some examples of polymerisation products obtained by reaction of dioxole (2) with fluoroolefins are also reported. (C) 2003 Elsevier B.V. All rights reserved.
Perfluorodioxoles
申请人:Ausimont S.p.A.
公开号:US06469185B1
公开(公告)日:2002-10-22
Perfluoro-4-alkyl-1,3-dioxoles having the general formula
wherein Rf is a perfluoroalkylic radical having from 1 to 5 carbon atoms, allow to prepare copolymers with Tg higher than those of the copolymers containing the same molar percentage of fluorinated dioxoles of the art.