N,N-dimethyl-2-(triphenyl-λ5-phosphanyl)ethanamine

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: N,N-dimethyl-2-(triphenyl-λ5-phosphanyl)ethanamine
• 化学式: C₂₂H₂₆NP
• 分子量: 335.4
• InChiKey: YURYRHAUORIJDC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.7
• 重原子数：
  24
• 可旋转键数：
  6
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.18
• 拓扑面积：
  3.2
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• [EN] PYRIDIN-3-YL ACETIC ACID DERIVATIVES AS INHIBITORS OF HUMAN IMMUNODEFICIENCY VIRUS REPLICATION<br/>[FR] DÉRIVÉS D'ACIDE PYRIDIN-3-YLE ACÉTIQUE UTILISÉS COMME INHIBITEURS DE LA RÉPLICATION DU VIRUS DE L'IMMUNODÉFICIENCE HUMAINE
  申请人：VIIV HEALTHCARE UK (NO 5) LTD

  公开号：WO2017025915A1

  公开（公告）日：2017-02-16

  Disclosed are compounds of Formula (I), including pharmaceutically acceptable salts, pharmaceutical compositions comprising the compounds, methods for making the compounds and their use in inhibiting HIV integrase and treating those infected with HIV or AIDS.

  揭示了公式（I）的化合物，包括药学上可接受的盐，包含这些化合物的药物组合物，制备这些化合物的方法以及它们在抑制HIV整合酶和治疗HIV或艾滋病感染者中的用途。
• CYCLOSPORIN A ANALOGS
  申请人：Allergan, Inc.

  公开号：US20160039880A1

  公开（公告）日：2016-02-11

  The present invention relates to novel cyclosporin analogs, processes for preparing them, pharmaceutical compositions containing them, and methods for using these analogs and the compositions containing them for the treatment of medical conditions, including but not limited to ocular conditions such as dry eye.

  本发明涉及新型环孢霉素类似物，制备它们的方法，含有它们的药物组合物，以及使用这些类似物和含有它们的组合物治疗医疗状况的方法，包括但不限于眼部状况如干眼症。
• [1,2,4]Triazolo[1,5-a]Pyridine and [1,2,4]Triazolo[1,5-c]Pyrimidine Compounds and Their Use
  申请人：Cancer Research Technology Limited

  公开号：US20140155594A1

  公开（公告）日：2014-06-05

  The present invention pertains generally to the field of therapeutic compounds, and more specifically to certain triazolo compounds (referred to herein as TAZ compounds), and especially certain [1,2,4]triazolo[1,5-a]pyridine and [1,2,4]triazolo[1,5-c]pyrimidine compounds, which, inter alia, inhibit AXL receptor tyrosine kinase function. The present invention also pertains to pharmaceutical compositions comprising such compounds, and the use of such compounds and compositions, both in vitro and in vivo, to inhibit AXL receptor tyrosine kinase function, and in the treatment of diseases and conditions that are mediated by AXL receptor tyrosine kinase, that are ameliorated by the inhibition of AXL receptor tyrosine kinase function, etc., including proliferative conditions such as cancer, etc.

  本发明涉及治疗化合物领域，更具体地涉及某些三唑化合物（在此称为TAZ化合物），特别是某些[1,2,4]三唑并[1,5-a]吡啶和[1,2,4]三唑并[1,5-c]嘧啶化合物，其中包括抑制AXL受体酪氨酸激酶功能的化合物。本发明还涉及包括这些化合物的制药组合物，以及使用这些化合物和组合物在体内外抑制AXL受体酪氨酸激酶功能，并用于治疗由AXL受体酪氨酸激酶介导的疾病和病症，通过抑制AXL受体酪氨酸激酶功能得到缓解的疾病和病症，包括增生性疾病如癌症等。
• Precatalyzed catalyst compositions, process for preparing epoxy resins, curable compositions, articles resulting from curing the resultant compositions
  申请人：THE DOW CHEMICAL COMPANY

  公开号：EP0441243A2

  公开（公告）日：1991-08-14

  The process of reacting an epoxy resin with a reactive hydrogen-containing compound or a carboxylic acid anhydride in the presence of a phosphonium catalyst is improved by employing a phosphonium compound having an amino substituent on the cation portion of the phosphonium compound as the catalyst. The invention also concerns precatalyzed epoxy resin compositions, curable compositions and cured compositions.

  本发明改进了在鏻催化剂存在下环氧树脂与活性含氢化合物或羧酸酐反应的工艺，采用了在鏻化合物阳离子部分具有氨基取代基的鏻化合物作为催化剂。本发明还涉及预催化环氧树脂组合物、可固化组合物和固化组合物。
• CMP polishing liquid and polishing method
  申请人：HITACHI CHEMICAL COMPANY, LTD.

  公开号：US10283373B2

  公开（公告）日：2019-05-07

  An embodiment of the present invention relates to a CMP polishing liquid used for polishing a polishing target surface having at least a cobalt-containing portion and a metal-containing portion that contains a metal other than cobalt, wherein the CMP polishing liquid contains polishing particles, a metal corrosion inhibitor and water, and has a pH of 4.0 or less, and when the corrosion potential EA of cobalt and the corrosion potential EB of the metal are measured in the CMP polishing liquid, the absolute value of the corrosion potential difference EA−EB between the corrosion potential EA and the corrosion potential EB is 0˜300 mV.

  本发明的一个实施例涉及一种用于抛光抛光目标表面的 CMP 抛光液，该抛光目标表面至少具有含钴部分和含有钴以外金属的含金属部分，其中 CMP 抛光液含有抛光颗粒、金属腐蚀抑制剂和水，且 pH 值为 4.0 或更低，当在 CMP 抛光液中测量钴的腐蚀电位 EA 和金属的腐蚀电位 EB 时，腐蚀电位 EA 和腐蚀电位 EB 之间的腐蚀电位差 EA-EB 的绝对值为 0˜300 mV。