N-[2-[(3,4-dimethylbenzoyl)amino]ethyl]-3,4-dimethylbenzamide

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: N-[2-[(3,4-dimethylbenzoyl)amino]ethyl]-3,4-dimethylbenzamide
• 化学式: C₂₀H₂₄N₂O₂
• 分子量: 324.4
• InChiKey: QQRIPCRXJPAROQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  24
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.3
• 拓扑面积：
  58.2
• 氢给体数：
  2
• 氢受体数：
  2

文献信息

• MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND FOR FORMING ORGANIC FILM
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20200332062A1

  公开（公告）日：2020-10-22

  An object of the present invention is to provide: a compound containing an imide group which is not only cured under film formation conditions of inert gas as well as air, generates no by-product and has excellent heat resistance and properties of filling and planarizing a pattern formed on a substrate, but can also form an organic underlayer film with favorable adhesion to a substrate. The present invention provides a material for forming an organic film, including: (A) a compound for forming an organic film shown by the following general formula (1A) or (1B); and (B) an organic solvent, noting that in the general formula (1A), when W 1 represents any of R 1 does not represent any of