1,4-Diazoniabicyclo[2.2.2]octane, 1,4-bis(phenylmethyl)- | 143797-25-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1,4-Diazoniabicyclo[2.2.2]octane, 1,4-bis(phenylmethyl)-
• 英文别名: 1,4-dibenzyl-1,4-diazoniabicyclo[2.2.2]octane
• CAS: 143797-25-5
• 化学式: C20H26N2+2
• 分子量: 294.4
• InChiKey: QDBSMKFBIMHREN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  22
• 可旋转键数：
  4
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

文献信息

• Imaging recording material and novel compound
  申请人：FUJIFILM Corporation

  公开号：EP1930770A2

  公开（公告）日：2008-06-11

  This invention provides an image recording material, comprising: on a support, a protective layer that contains a crosslinked polymer formed of a polymer (a) having at least one kind of ionically crosslinkable functional group, and a low molecular weight compound (b) having at least one kind of ionically crosslinkable functional group, on an image recording layer, the image recording layer containing a compound (A), having at least one kind of ethylenically unsaturated bond, and a polymerization initiator (B).

  本发明提供了一种图像记录材料，包括：在支撑体上，包含交联聚合物的保护层，交联聚合物由具有至少一种可离子交联官能团的聚合物（a）和具有至少一种可离子交联官能团的低分子量化合物（b）形成；在图像记录层上，图像记录层包含具有至少一种乙烯不饱和键的化合物（A）和聚合引发剂（B）。
• IMAGE RECORDING MATERIAL AND NOVEL COMPOUND
  申请人：WARIISHI Koji

  公开号：US20080145782A1

  公开（公告）日：2008-06-19

  This invention provides an image recording material, comprising: on a support, a protective layer that contains a crosslinked polymer formed of a polymer (a) having at least one kind of ionically crosslinkable functional group, and a low molecular weight compound (b) having at least one kind of ionically crosslinkable functional group, on an image recording layer, the image recording layer containing a compound (A), having at least one kind of ethylenically unsaturated bond, and a polymerization initiator (B).
• POLISHING LIQUID
  申请人：KAMIMURA Tetsuya

  公开号：US20080203354A1

  公开（公告）日：2008-08-28

  The invention provides a polishing liquid for polishing a barrier layer of a semiconductor integrated circuit, the polishing liquid comprising: a diquaternary ammonium cation; a corrosion inhibiting agent; and a colloidal silica, wherein the pH of the polishing liquid is in the range of 2.5 to 5.0. According to the invention, a polishing liquid capable of achieving a superior barrier layer polishing rate, as well as suppressing the occurrence of scratching due to the agglomeration of solid abrasive grains can be provided.
• POLISHING LIQUID AND POLISHING METHOD USING THE SAME
  申请人：Kamimura Tetsuya

  公开号：US20090087989A1

  公开（公告）日：2009-04-02

  The invention provides a polishing liquid used for chemical mechanical polishing during planarization of a semiconductor integrated circuit, having at least: a benzotriazole compound (A) represented by the following Formula (1); an acid (B); and a water-soluble polymer (C). The invention further provides a polishing method for planarizing a semiconductor integrated circuit, the polishing method includes at least essentially chemically and mechanically polishing a barrier layer of the semiconductor integrated circuit using the polishing liquid. In Formula (1), each of R 01 to R 05 independently represents a hydrogen atom or an alkyl group, and at least one of R 01 to R 05 represents an alkyl group.
• Optical Information-Recording Medium and Information-Recording Method
  申请人：Takahashi Keita

  公开号：US20090130366A1

  公开（公告）日：2009-05-21

  There is provided an optical information-recording medium, comprising a recording layer capable of recording of information by irradiation of a laser beam having a wavelength of 440 nm or less on or above a substrate, the recording layer comprising a dye having two or more independent dye moieties in the molecule that are bound to each other in a manner other than by forming a conjugated bond to the dye moieties, and a method of recording information, comprising recording information by irradiating a laser beam having a wavelength of 440 nm or less on or above the optical information-recording medium according to the present invention described above.