[4-[2-[(2-Methylpropan-2-yl)oxy]-2-oxoethoxy]naphthalen-1-yl]-diphenylsulfanium

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: [4-[2-[(2-Methylpropan-2-yl)oxy]-2-oxoethoxy]naphthalen-1-yl]-diphenylsulfanium
• 化学式: C28H27O3S+
• 分子量: 443.6
• InChiKey: FXJDCECTQUQZJG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7.7
• 重原子数：
  32
• 可旋转键数：
  8
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.18
• 拓扑面积：
  36.5
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• Acid generating agent for chemically amplified resist compositions
  申请人：Jung Sung-Do

  公开号：US20090291390A1

  公开（公告）日：2009-11-26

  An acid generating agent represented by the following formula (1) or (2) is provided, which is included in chemically amplified resist compositions: wherein in the formula (1) and (2), X represents an unsubstituted or substituted alkyl group having 1 to 20 carbon atoms and selected from alkyl, haloalkyl and alkylsulfonyl, which may have at least one hydrogen atom substituted by an ether group, an ester group, a carbonyl group, an acetal group, a nitrile group, a cyano group, a hydroxyl group, a carboxyl group or an aldehyde group, or represents a perfluoroalkyl group having 1 to 4 carbon atoms; R 6 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a heteroatom selected from nitrogen, sulfur, fluorine and oxygen; m is an integer from 0 to 2; and A+ is an organic counterion.

  提供了以下公式（1）或（2）所代表的酸生成剂，该酸生成剂包含在化学增感抗蚀剂组成物中：在公式（1）和（2）中，X代表具有1至20个碳原子的未取代或取代的烷基基团，并且选择自烷基、卤代烷基和烷基磺酰基，该基团可能至少有一个氢原子被醚基团、酯基团、羰基团、缩醛基团、腈基团、氰基团、羟基团、羧基团或醛基团取代，或代表具有1至4个碳原子的全氟烷基基团；R6代表具有1至10个碳原子的烷基基团、具有1至10个碳原子的烷氧基团，或选择自氮、硫、氟和氧的杂原子；m为0至2的整数；A+为有机对离子。
• PHOTOACID GENERATOR, METHOD FOR PRODUCING THE SAME, AND RESIST COMPOSITION COMPRISING THE SAME
  申请人：OH Jung Hoon

  公开号：US20120203024A1

  公开（公告）日：2012-08-09

  A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y 1 , Y 2 , X, R 1 , R 2 , n 1 , n 2 and A + have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.

  提供以下公式（1）所代表的光酸发生剂、生产光酸发生剂的方法以及含有光酸发生剂的抗蚀组合物。在公式（1）中，Y1、Y2、X、R1、R2、n1、n2和A+的含义与发明详细说明中定义的含义相同。该光酸发生剂可以在ArF液体浸没光刻时保持适当的接触角，可以减少液体浸没光刻过程中发生的缺陷，并且在抗蚀溶剂中具有优异的溶解性和与树脂的优异兼容性。此外，该光酸发生剂可以通过使用工业上易获得的环氧化合物进行高效简单的生产方法制备。
• Photoacid generator containing aromatic ring
  申请人：Oh Jung-Hoon

  公开号：US20100113818A1

  公开（公告）日：2010-05-06

  An acid generator represented by the following formula (1) is provided: wherein X represents an alkylene group having 1 to 10 carbon atoms, —X 1 —O—X 2 —, or a heteroatom selected from the group consisting of nitrogen, sulfur and fluorine; X 1 and X 2 each independently represent an alkylene group having 1 to 10 carbon atoms; Y represents a cyclic hydrocarbon group having 5 to 30 carbon atoms and containing one or more aromatic rings, while one or more hydrogen atoms on the ring of the cyclic hydrocarbon group may be substituted by one or more members selected from the group consisting of —O—Y 1 , —CO—Y 2 , an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a perfluoroalkyl group having 1 to 4 carbon atoms, a perfluoroalkoxy group having 1 to 4 carbon atoms, a hydroxyalkyl group having 1 to 6 carbon atoms, a halogen atom, a hydroxyl group and a cyano group; Y 1 and Y 2 each independently represent an alkyl group having 1 to 6 carbon atoms; n represents an integer of 0 or 5; and A + represents an organic counterion.

  提供以下公式（1）所表示的酸发生剂：其中，X代表具有1至10个碳原子的烷基基团，-X1-O-X2-或从氮、硫和氟组成的杂原子中选择的一个；X1和X2各自独立地表示具有1至10个碳原子的烷基基团；Y表示含有5至30个碳原子并含有一个或多个芳香环的环状烃基团，环状烃基团的环上一个或多个氢原子可以被选择自-O-Y1、-CO-Y2、具有1至6个碳原子的烷基基团、具有1至6个碳原子的烷氧基团、具有1至4个碳原子的全氟烷基团、具有1至4个碳原子的全氟烷氧基团、具有1至6个碳原子的羟基烷基团、卤素原子、羟基团和氰基的一个或多个成员取代；Y1和Y2各自独立地表示具有1至6个碳原子的烷基基团；n表示0或5的整数；A+表示有机对离子。
• ADDITIVE FOR RESIST AND RESIST COMPOSITION COMPRISING SAME
  申请人：KOREA KUMHO PETROCHEMICAL CO., LTD.

  公开号：US20130171561A1

  公开（公告）日：2013-07-04

  A resist additive represented by Formula 1 below and a resist composition including the additive are disclosed. The resist additive improves hydrophobicity of the surface of the resist film to prevent materials from being leached in water during exposure of immersion lithography and is converted to have hydrophilicity by deprotection reaction during development. As a result, a micropattern of a resist film with excellent sensitivity and high resolution is formed. In Formula 1, the substituents are defined as described in the specification.

  本发明揭示了一种由下式1表示的抗蚀添加剂和包括该添加剂的抗蚀组合物。该抗蚀添加剂可以提高抗蚀膜表面的疏水性，以防止在浸没光刻曝光期间材料被水溶出，并在显影期间通过去保护反应转化为亲水性。因此，形成了具有优异灵敏度和高分辨率的抗蚀膜微图案。在式1中，取代基的定义如说明书中所述。
• NOVEL ACRYL MONOMER, POLYMER AND RESIST COMPOSITION COMPRISING SAME
  申请人：KOREA KUMHO PETROCHEMICAL CO., LTD.

  公开号：US20130164674A1

  公开（公告）日：2013-06-27

  Disclosed are an acrylic monomer having a structure represented by formula (1), a polymer containing a repeating unit derived from the acrylic monomer, and a resist composition prepared by using the polymer, which exhibits excellent adhesiveness, storage stability, and enhanced line width roughness, exhibits excellent resolution in both C/H patterns and L/S patterns, has an excellent process window so that an excellent pattern profile can be obtained regardless of the type of the substrate, and exhibits improved contrast.

  公开了一种具有式（1）表示的结构的丙烯酸单体，含有从丙烯酸单体衍生的重复单元的聚合物以及使用该聚合物制备的抗蚀剂组合物，该组合物具有优异的粘附性、储存稳定性和线宽粗糙度增强性，无论基板类型如何，都能在C/H图案和L/S图案中表现出优异的分辨率，具有优异的工艺窗口，因此可以获得优异的图案轮廓，并且具有改善的对比度。