1,2-Bis(trichloromethyl)benzene | 25640-77-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1,2-Bis(trichloromethyl)benzene
• CAS: 25640-77-1
• 化学式: C₈H₄Cl₆
• 分子量: 312.8
• InChiKey: WEWXCIOGPKAVFO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.2
• 重原子数：
  14
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为反应物：
  描述：

  1,2-Bis(trichloromethyl)benzene 生成 tetrabromophthaloyl chloride
  参考文献：
  名称：

  GASANOV, G. M.;GUSEJNOV, M. M.;BABAEV, S. B., AZERB. XIM. ZH.,(1986) N 4, 60-64

  摘要：

  DOI：

文献信息

• NOVOLAC RESIN AND RESIST FILM
  申请人：DIC Corporation

  公开号：US20180334523A1

  公开（公告）日：2018-11-22

  Provided are a novolac resin having developability, heat resistance, and dry etching resistance, and a photosensitive composition, a curable composition, and a resist film. A novolac resin including, as a repeating unit, a structural moiety represented by Structural Formula (1) or (2): (in the formula, Ar represents an arylene group, R 1 's each independently represent any one of a hydrogen atom, an alkyl group, an alkoxy group, and a halogen atom, m's each independently represent an integer of 1 to 3, and X is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group) in which at least one of X's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group.

  提供一种具有可开发性、耐热性和干法蚀刻抗性的新戊醛树脂，以及一种光敏组合物、可固化组合物和抗蚀膜。一种新戊醛树脂包括以下结构单元： （在公式中，Ar代表芳基，R 1 分别独立地代表氢原子、烷基、烷氧基和卤素原子中的任意一种，m分别独立地代表1至3的整数，X代表氢原子、三级烷基、烷氧基烷基、酰基、烷氧羰基、含杂原子的环烃基和三烷基硅基中的任意一种），树脂中至少有一个X是三级烷基、烷氧基烷基、酰基、烷氧羰基、含杂原子的环烃基和三烷基硅基中的任意一种。
• CLEAN PROCESS FOR PREPARING CHLOROFORMYL-SUBSTITUTED BENZENE
  申请人：Shanghai Fanglun New Material Technology Co., Ltd.

  公开号：US20170283360A1

  公开（公告）日：2017-10-05

  Clean process for preparing a chloroformyl-substituted benzene by oxidation of a tail gas hydrogen chloride from a chlorination reaction and a chloroacylation reaction and recycling of the resulting oxidation product chlorine gas into the chlorination reaction. The present invention provides a clean process for preparing a polymer-grade chloroformyl-substituted benzene.

  通过氯化反应和氯乙酰化反应氧化尾气氯化氢，然后将产生的氧化产物氯气循环回氯化反应中，从而准备氯甲酰取代苯的清洁工艺。本发明提供了一种制备聚合级氯甲酰取代苯的清洁工艺。
• METHOD FOR THE PREPARATION OF TRICHLOROMETHYL-GROUP-SUBSTITUTED BENZENE
  申请人：SHANGHAI FANGLUN NEW MATERIAL TECHNOLOGY CO., LTD.

  公开号：US20160152533A1

  公开（公告）日：2016-06-02

  The present application relates to a method for photochlorination, and specifically to photochlorination by a photochemical reaction of an aromatic compound with gaseous chlorine so as to prepare a trichloromethyl-substituted benzene, and to a method using bis-(trichloromethyl)-benzene as the trichloromethyl-substituted benzene to prepare by further reaction bis-(chloroformyl)-benzene. Through the control of temperature, illuminance and consumption of gaseous chlorine, the method of this application can greatly improve the purity of trichloromethyl-substituted benzene and further prepare polymer-grade bis-(chloroformyl)-benzene with low cost. The present application also relates to a method for purifying trichloromethyl-substituted benzene, and specifically to a method for purifying trichloromethyl-substituted benzene via molecular distillation. The present application further relates to a photochlorination reactor for use in photochlorination reactions (such as those of the present application).

  本申请涉及一种光氯化方法，具体涉及通过芳香化合物与氯气的光化学反应来制备三氯甲基取代苯，并且使用双-(三氯甲基)-苯作为三氯甲基取代苯，通过进一步反应制备双-(氯甲酰基)-苯的方法。通过控制温度、光照强度和氯气消耗量，本申请的方法可以大大提高三氯甲基取代苯的纯度，并进一步以低成本制备聚合级双-(氯甲酰基)-苯。本申请还涉及一种纯化三氯甲基取代苯的方法，具体涉及通过分子蒸馏纯化三氯甲基取代苯的方法。本申请还涉及用于光氯化反应的光氯化反应器（例如本申请的反应）。
• Process for preparing fluorine-containing norbornene derivative
  申请人：DAIKIN INDUSTRIES, LTD.

  公开号：US20040214103A1

  公开（公告）日：2004-10-28

  There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F 2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.

  提供了一种新型的诺博烯衍生物，可用作F2激光化学扩增型光刻胶的材料，具有优异的透明性和改善的干法蚀刻抗性，并且具有直接连接到诺博烯骨架的含氟酮基或含氟三级醇基；通过使用该诺博烯衍生物作为共聚单体获得的含氟聚合物；以及包括含氟聚合物、光酸发生剂和溶剂的化学扩增型光刻胶组合物。
• Selective and specific preparation of discrete peg compounds
  申请人：Davis D. Paul

  公开号：US20060020134A1

  公开（公告）日：2006-01-26

  Aspects of the present invention are directed to novel methods for making discrete polyethylene compounds selectively and specifically to a predetermined number of ethylene oxide units. Methods which can be used to build up larger dPEG compounds (a) containing a wider range of utility to make useful homo- and heterofunctional and branched species, and (b) under reaction configurations and conditions that are milder, more efficient, more diverse in terms of incorporating useful functionality, more controllable, and more versatile then any conventional method reported in the art to date. In addition, the embodiments of the invention allow for processes that allow for significantly improving the ability to purify the intermediates or final product mixtures, making these methods useful for commerial manufacturing dPEGs. Protecting groups and functional groups can be designed to make purification at large scale a practical reality. The novel dPEG products form the compositional and material basis for making other novel compounds of valuable application in the fields of diagnostics and therapeutics, amongst others.

  本发明的方面涉及制备离散聚乙烯化合物的新方法，可选择性地并且特异性地制备到预定数量的氧乙烯单元。这些方法可用于构建更大的dPEG化合物（a）包含更广泛的实用性，以制备有用的同/异功能和支化物种，以及（b）在反应配置和条件下，这些条件比迄今为止报告的任何传统方法更温和、更高效、更多样化，更具有控制性和更具有多功能性。此外，本发明的实施方式允许进行显著改善中间体或最终产品混合物的纯化能力的过程，使这些方法对于商业制造dPEGs非常有用。保护基团和功能基团可以设计为使大规模纯化成为现实。新型dPEG产品形成了制备其他有价值的诊断和治疗领域的新型化合物的组成和材料基础。