(4-Iodophenyl)-diphenylsulfanium

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: (4-Iodophenyl)-diphenylsulfanium
• 化学式: C18H14IS+
• 分子量: 389.3
• InChiKey: KXZPXLJMPAZPLV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  6.2
• 重原子数：
  20
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  1
• 氢给体数：
  0
• 氢受体数：
  0

文献信息

• PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES
  申请人：FUJIWARA Masaki

  公开号：US20080108846A1

  公开（公告）日：2008-05-08

  A process for producing an alkoxycarbonylfluoroalkanesulfonate represented by the formula [1] is provided. This process includes the steps of (a) reacting a halofluoroalkanoate represented by the formula [2], with a sulfinating agent, thereby obtaining an alkoxycarbonylfluoroalkanesulfinate represented by the formula [3]; and (b) reacting the alkoxycarbonylfluoroalkanesulfinate with an oxidizing agent, thereby obtaining the target alkoxycarbonylfluoroalkanesulfonate. Furthermore, it is possible to react the obtained alkoxycarbonylfluoroalkanesulfonate with a monovalent onium salt to conduct a salt exchange, thereby obtaining a alkoxycarbonylfluoroalkanesulfonic acid onium salt represented by the formula [4].

  提供了一种制备由公式[1]表示的烷氧羰基氟代烷磺酸盐的方法。这个过程包括以下步骤：(a)使由公式[2]表示的卤氟代烷酸盐与亚磺化剂反应，从而获得由公式[3]表示的烷氧羰基氟代烷亚磺酸盐；以及(b)使烷氧羰基氟代烷亚磺酸盐与氧化剂反应，从而获得目标烷氧羰基氟代烷磺酸盐。此外，可以将获得的烷氧羰基氟代烷磺酸盐与单价阳离子盐进行反应，进行盐交换，从而获得由公式[4]表示的烷氧羰基氟代烷磺酸阳离子盐。
• Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method
  申请人：Central Glass Company, Limited

  公开号：US20130130175A1

  公开（公告）日：2013-05-23

  A sulfonic acid onium salt represented by the following formula (1) useful as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt corresponding to the formula (1): in which R 1 represents a monovalent organic group, and Q + represents a sulfonium cation or iodonium cation.

  以下是用作优良的辐射敏感性酸发生剂的磺酸醋銨盐的化学式（1）。通过使用含有与化学式（1）对应的磺酸醋銨盐的抗蚀组合物，可以形成良好的图案： 其中R1代表一价有机基团，Q+代表磺銨阳离子或碘銨阳离子。
• Acid generating agent for chemically amplified resist compositions
  申请人：Jung Sung-Do

  公开号：US20090291390A1

  公开（公告）日：2009-11-26

  An acid generating agent represented by the following formula (1) or (2) is provided, which is included in chemically amplified resist compositions: wherein in the formula (1) and (2), X represents an unsubstituted or substituted alkyl group having 1 to 20 carbon atoms and selected from alkyl, haloalkyl and alkylsulfonyl, which may have at least one hydrogen atom substituted by an ether group, an ester group, a carbonyl group, an acetal group, a nitrile group, a cyano group, a hydroxyl group, a carboxyl group or an aldehyde group, or represents a perfluoroalkyl group having 1 to 4 carbon atoms; R 6 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a heteroatom selected from nitrogen, sulfur, fluorine and oxygen; m is an integer from 0 to 2; and A+ is an organic counterion.

  提供了以下公式（1）或（2）所代表的酸生成剂，该酸生成剂包含在化学增感抗蚀剂组成物中：在公式（1）和（2）中，X代表具有1至20个碳原子的未取代或取代的烷基基团，并且选择自烷基、卤代烷基和烷基磺酰基，该基团可能至少有一个氢原子被醚基团、酯基团、羰基团、缩醛基团、腈基团、氰基团、羟基团、羧基团或醛基团取代，或代表具有1至4个碳原子的全氟烷基基团；R6代表具有1至10个碳原子的烷基基团、具有1至10个碳原子的烷氧基团，或选择自氮、硫、氟和氧的杂原子；m为0至2的整数；A+为有机对离子。
• PHOTOACID GENERATOR, METHOD FOR PRODUCING THE SAME, AND RESIST COMPOSITION COMPRISING THE SAME
  申请人：OH Jung Hoon

  公开号：US20120203024A1

  公开（公告）日：2012-08-09

  A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y 1 , Y 2 , X, R 1 , R 2 , n 1 , n 2 and A + have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.

  提供以下公式（1）所代表的光酸发生剂、生产光酸发生剂的方法以及含有光酸发生剂的抗蚀组合物。在公式（1）中，Y1、Y2、X、R1、R2、n1、n2和A+的含义与发明详细说明中定义的含义相同。该光酸发生剂可以在ArF液体浸没光刻时保持适当的接触角，可以减少液体浸没光刻过程中发生的缺陷，并且在抗蚀溶剂中具有优异的溶解性和与树脂的优异兼容性。此外，该光酸发生剂可以通过使用工业上易获得的环氧化合物进行高效简单的生产方法制备。
• FLUOROCARBOXYLIC ACID-CONTAINING MONOMER, FLUOROCARBOXYLIC ACID-CONTAINING POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20210341839A1

  公开（公告）日：2021-11-04

  A fluorocarboxylic acid-containing polymer comprising recurring units having formula (A1), but not acid labile group-containing recurring units is provided. A resist composition comprising the same offers a high sensitivity and is unsusceptible to nano-bridging or pattern collapse independent of whether it is of positive or negative tone.

  提供一种含有氟羧酸的聚合物，其中包含具有式（A1）的重复单元，但不含有酸不稳定的重复单元。包含该聚合物的抗蚀剂组合物具有高灵敏度，并且无论是正向还是负向调色板，都不易出现纳米桥接或图案坍塌。