The laminate according to the invention is comprised of a base material (A), a silicon-containing layer (B) and a polymer layer (C) obtained from an organic acid metallic salt having a polymerizable group. The silicon-containing layer (B) and the polymer layer (C) are sequentially laminated over at least one surface of the base material (A), the silicon-containing layer (B) includes a high nitrogen concentration region comprised of silicon atoms and nitrogen atoms, silicon atoms and nitrogen atoms and oxygen atoms, or silicon atoms and nitrogen atoms and oxygen atoms and carbon atoms. The high nitrogen concentration region is formed by irradiating energy ray onto a polysilazane film formed over the base material (A) under an oxygen concentration equal to or lower than 5% and/or a relative humidity at room temperature (23° C.) equal to or lower than 30% so as to denature at least a part of the film.
本发明的层压板由基材料(A)、含
硅层(B)和聚合物层(C)组成,聚合物层(C)是从具有聚合基团的有机酸
金属盐制备而成。
硅含量层(B)和聚合物层(C)被顺序地层压在基材料(A)的至少一个表面上,
硅含量层(B)包括高氮浓度区,由
硅原子和氮原子、
硅原子和氮原子和氧原子,或
硅原子和氮原子和氧原子和碳原子组成。高氮浓度区是通过在氧浓度等于或低于5%和/或相对湿度在室温(23°C)等于或低于30%的条件下,对基材料(A)上形成的聚
硅氮烷薄膜照射能量射线而形成的,以使膜的至少一部分变性。