2-Nitrobenzyl alcohol, trifluoroacetate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2-Nitrobenzyl alcohol, trifluoroacetate
• 英文别名: (2-nitrophenyl)methyl 2,2,2-trifluoroacetate
• 化学式: C9H6F3NO4
• 分子量: 249.14
• InChiKey: OZQQCNFQWWXLIC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.9
• 重原子数：
  17
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.22
• 拓扑面积：
  72.1
• 氢给体数：
  0
• 氢受体数：
  7

文献信息

• Photolabile blocked surfactants and compositions containing the same
  申请人：MINNESOTA MINING AND MANUFACTURING COMPANY

  公开号：EP0046083A2

  公开（公告）日：1982-02-17

  Surfactants which are blocked against surfactant action (identified herein as "photolabile blocked surfactants") by a photolabile protective or masking group but which, on exposure to actinic radiation, become unblocked are provided. Coating compositions in which surfactant is formed on irradiation are provided by blending the photolabile blocked surfactant with polymeric film-forming materials. Compositions containing the photolabile blocked surfactants are useful when employed as protective coatings on various substrates or as the adhesive in a pressure sensitive adhesive tape. Although initially well adhering to a substrate, such compositions may be readily removed from the substrate following exposure of the same to suitable radiation which unblocks the surfactant to permit it to regain its surfactant activity.

  本发明提供的表面活性剂（此处称为 "光敏阻滞表面活性剂"）被光敏保护基团或掩蔽基团阻滞，但在暴露于光辐射时会解除阻滞。通过将光亲和性受阻表面活性剂与聚合物成膜材料混合，可提供在辐照时形成表面活性剂的涂层组合物。 含有光敏封端表面活性剂的组合物在用作各种基材的保护涂层或压敏胶带的粘合剂时非常有用。虽然最初能很好地粘附在基材上，但当基材暴露在适当的辐射下，表面活性剂就会解除阻塞，从而恢复其表面活性剂的活性，这样，这种组合物就可以很容易地从基材上去除。
• PHOTOSENSITIVE POLYSILAZANE COMPOSITION AND METHOD OF FORMING PATTERNED POLYSILAZANE FILM
  申请人：TonenGeneral Sekiyu K.K.

  公开号：EP1164435A1

  公开（公告）日：2001-12-19

  A photosensitive polysilazane which may be used as a positive-tone photoresist, and a method of forming a patterned polysilazane film by use of such a composition are provided. The photosensitive polysilazane composition of the invention is characterized by comprising a polysilazane, particularly polymethylsilazane or polyphenylsilazane, and an optically acid-generating agent. The patterned polysilazane film is obtained by exposing a coating of the photosensitive polysilazane composition of the invention to light in a pattern and dissolving off the exposed portion.

  本发明提供了一种可用作正色调光刻胶的光敏聚硅氮烷，以及使用这种组合物形成图案化聚硅氮烷薄膜的方法。本发明的光敏聚硅氮烷组合物的特点是由一种聚硅氮烷（特别是聚甲基硅氮烷或聚苯基硅氮烷）和一种光学酸生成剂组成。将本发明的光敏聚硅氮烷组合物涂层按一定图案对光照射，然后溶解掉照射部分，即可得到图案化的聚硅氮烷薄膜。
• PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF
  申请人：CLARIANT INTERNATIONAL LTD.

  公开号：EP1239332A1

  公开（公告）日：2002-09-11

  A finely patterned silica type ceramic film suitable as an inter-layer dielectric is formed in a short time by applying, onto a substrate, a positive working radiation sensitive polysilazane composition comprising a modified poly(sil sesquiazane) having a number average molecular weight of 100 to 100,000 and containing a basic constituent unit represented by the general formula: -[SiR6(NR7)1.5]- and other constituent units represented by the general formula: -[SiR62NR7]- and/or -[SiR63(NR7)0.5]- (R6 and R7 independently represent a hydrogen atom, a C1-3 alkyl group or a substituted or unsubstituted phenyl group) in a ratio of 0.1 to 100 mol-% to said basic constituent unit, a photo acid generator and preferably a water-soluble compound as a shape stabilizer, then patternwise exposing the resultant coating film, subjecting the exposed part of the coating film to moistening treatment, developing it with an aqueous alkali solution, wholly exposing the coating film to light and moistening treatment again, followed by burning treatment.

  一种适用于层间电介质的精细图案化二氧化硅型陶瓷膜是通过在基底上涂敷一种正工作辐射敏感性聚硅氮烷组合物在短时间内形成的，该组合物包含一种改性聚硅氮烷，其平均分子量为 100 至 100000，并含有由通式表示的基本组成单元：-[SiR6(NR7)1.5]-和由通式代表的其他组成单元：-[SiR62NR7]-和/或-[SiR63(NR7)0.5]-(R6 和 R7 独立地代表氢原子、C1-3 烷基或取代或未取代的苯基)，与所述基本组成单元的比例为 0.然后，将所得涂膜进行图案化曝光，将涂膜的曝光部分进行湿润处理，用碱水溶液显影，将涂膜完全曝光于光并再次进行湿润处理，然后进行灼烧处理。
• Method and apparatus for combinatorial chemistry
  申请人：——

  公开号：US20010029028A1

  公开（公告）日：2001-10-11

  A method and apparatus are provided for performing light-directed reactions in spatially addressable channels within a plurality of channels. One aspect of the invention employs photoactivatable reagents in solutions disposed into spatially addressable flow streams to control the parallel synthesis of molecules immobilized within the channels. The reagents may be photoactivated within a subset of channels at the site of immobilized substrate molecules or at a light-addressable site upstream from the substrate molecules. The method and apparatus of the invention find particularly utility in the synthesis of biopolymer arrays, e.g., oligonucleotides, peptides and carbohydrates, and in the combinatorial synthesis of small molecule arrays for drug discovery.

  本发明提供了一种在多个通道内的空间可寻址通道中进行光导反应的方法和装置。本发明的一个方面是在配置成空间可寻址流的溶液中使用光活化试剂，以控制固定在通道内的分子的平行合成。试剂可以在固定底物分子的位置或底物分子上游的可寻址位置的子集通道内被光激活。本发明的方法和装置尤其适用于合成生物聚合物阵列，如寡核苷酸、肽和碳水化合物，以及用于药物发现的小分子阵列的组合合成。
• Photosensitive ploysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof
  申请人：——

  公开号：US20030113657A1

  公开（公告）日：2003-06-19

  A finely patterned silica type ceramic film suitable as an inter-layer dielectric is formed in a short time by applying, onto a substrate, a positive working radiation sensitive polysilazane composition comprising a modified poly(sil sesquiazane) having a number average molecular weight of 100 to 100,000 and containing a basic constituent unit represented by the general formula: —[SiR 6 (NR 7 ) 1.5 ]— and other constituent units represented by the general formula: —[SiR 6 2 NR 7 ]— and/or —[SiR 6 3 (NR 7 ) 0.5 ]— (R 6 and R 7 independently represent a hydrogen atom, a C 1-3 alkyl group or a substituted or unsubstituted phenyl group) in a ratio of 0.1 to 100 mol-% to said basic constituent unit, a photo acid generator and preferably a water-soluble compound as a shape stabilizer, then patternwise exposing the resultant coating film, subjecting the exposed part of the coating film to moistening treatment, developing it with an aqueous alkali solution, wholly exposing the coating film to light and moistening treatment again, followed by burning treatment.

  通过在基底上涂敷一种正工作辐射敏感聚硅氮烷组合物，可在短时间内形成一种适于作为层间电介质的精细图案化二氧化硅型陶瓷膜，该组合物由改性聚（硅烷）组成，其平均分子量为 100 至 100000，并含有由通式表示的基本组成单元：-[SiR 6 (NR 7 ) 1.5 及其他由通式代表的组成单元：-[SiR 6 2 NR 7 ]-和/或-[SiR 6 3 （NR 7 ) 0.5 ]- (R 6 和 R 7 分别代表一个氢原子、一个 C 1-3 烷基或取代或未取代的苯基）的比例为 0.1 至 100 摩尔-%、光酸发生器和优选的水溶性化合物作为形状稳定剂，然后将得到的涂膜按图案进行曝光，将涂膜的曝光部分进行湿润处理，用碱水溶液显影，将涂膜完全暴露在光线下并再次进行湿润处理，然后进行灼烧处理。