Methyl-(4-methylsulfanylphenyl)-phenylsulfanium

• 分子结构分类: 有机化合物 - 有机硫化合物 - 硫醚类
• 英文名称: Methyl-(4-methylsulfanylphenyl)-phenylsulfanium
• 化学式: C14H15S2+
• 分子量: 247.4
• InChiKey: VXDVFUCVNLIZSS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.5
• 重原子数：
  16
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  1

文献信息

• Acid generating agent for chemically amplified resist compositions
  申请人：Jung Sung-Do

  公开号：US20090291390A1

  公开（公告）日：2009-11-26

  An acid generating agent represented by the following formula (1) or (2) is provided, which is included in chemically amplified resist compositions: wherein in the formula (1) and (2), X represents an unsubstituted or substituted alkyl group having 1 to 20 carbon atoms and selected from alkyl, haloalkyl and alkylsulfonyl, which may have at least one hydrogen atom substituted by an ether group, an ester group, a carbonyl group, an acetal group, a nitrile group, a cyano group, a hydroxyl group, a carboxyl group or an aldehyde group, or represents a perfluoroalkyl group having 1 to 4 carbon atoms; R 6 represents an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or a heteroatom selected from nitrogen, sulfur, fluorine and oxygen; m is an integer from 0 to 2; and A+ is an organic counterion.

  提供了以下公式（1）或（2）所代表的酸生成剂，该酸生成剂包含在化学增感抗蚀剂组成物中：在公式（1）和（2）中，X代表具有1至20个碳原子的未取代或取代的烷基基团，并且选择自烷基、卤代烷基和烷基磺酰基，该基团可能至少有一个氢原子被醚基团、酯基团、羰基团、缩醛基团、腈基团、氰基团、羟基团、羧基团或醛基团取代，或代表具有1至4个碳原子的全氟烷基基团；R6代表具有1至10个碳原子的烷基基团、具有1至10个碳原子的烷氧基团，或选择自氮、硫、氟和氧的杂原子；m为0至2的整数；A+为有机对离子。
• SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION, AND RESIST COMPOSITION
  申请人：SAN-APRO LTD.

  公开号：US20210147352A1

  公开（公告）日：2021-05-20

  The sulfonium salt has high photosensitivity to i-rays and high compatibility with cationically polymerizable compounds such as epoxy compounds, and is excellent storage stability in formulations containing such compounds. The sulfonium salt is represented by general formula (1). In formula (1), R represents an alkyl group or an aryl group; substituents, R1 to R5, each independently represent an alkyl group, a hydroxy group, an alkoxy group, an aryl group, an aryloxy group, a hydroxy(poly)alkyleneoxy group, or a halogen atom; R6 to R9 each independently represent an alkyl group, an aryl group, or a hydrogen atom; m 1 to m 5 each represent the number of occurrences of each of R1 to R5, m 1 and m 4 represent an integer of 0 to 3, m 2 and m 5 represent an integer of 0 to 4, m 3 represents an integer of 0 to 5, and X − represents a monovalent polyatomic anion.

  砜盐对紫外线具有很高的光敏性，与环氧化合物等阳离子聚合物化合物具有很高的相容性，并且在含有这些化合物的配方中具有优异的储存稳定性。砜盐的通用式表示为（1）。在式（1）中，R代表烷基或芳基；取代基R1至R5分别独立地代表烷基、羟基、烷氧基、芳基、芳氧基、羟基(聚)烷氧基或卤素原子；R6至R9分别独立地代表烷基、芳基或氢原子；m1至m5分别代表R1至R5的出现次数，m1和m4表示0到3的整数，m2和m5表示0到4的整数，m3表示0到5的整数，X−表示一价多原子阴离子。
• PHOTOACID GENERATOR, METHOD FOR PRODUCING THE SAME, AND RESIST COMPOSITION COMPRISING THE SAME
  申请人：OH Jung Hoon

  公开号：US20120203024A1

  公开（公告）日：2012-08-09

  A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y 1 , Y 2 , X, R 1 , R 2 , n 1 , n 2 and A + have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.

  提供以下公式（1）所代表的光酸发生剂、生产光酸发生剂的方法以及含有光酸发生剂的抗蚀组合物。在公式（1）中，Y1、Y2、X、R1、R2、n1、n2和A+的含义与发明详细说明中定义的含义相同。该光酸发生剂可以在ArF液体浸没光刻时保持适当的接触角，可以减少液体浸没光刻过程中发生的缺陷，并且在抗蚀溶剂中具有优异的溶解性和与树脂的优异兼容性。此外，该光酸发生剂可以通过使用工业上易获得的环氧化合物进行高效简单的生产方法制备。
• Photoacid generator containing aromatic ring
  申请人：Oh Jung-Hoon

  公开号：US20100113818A1

  公开（公告）日：2010-05-06

  An acid generator represented by the following formula (1) is provided: wherein X represents an alkylene group having 1 to 10 carbon atoms, —X 1 —O—X 2 —, or a heteroatom selected from the group consisting of nitrogen, sulfur and fluorine; X 1 and X 2 each independently represent an alkylene group having 1 to 10 carbon atoms; Y represents a cyclic hydrocarbon group having 5 to 30 carbon atoms and containing one or more aromatic rings, while one or more hydrogen atoms on the ring of the cyclic hydrocarbon group may be substituted by one or more members selected from the group consisting of —O—Y 1 , —CO—Y 2 , an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a perfluoroalkyl group having 1 to 4 carbon atoms, a perfluoroalkoxy group having 1 to 4 carbon atoms, a hydroxyalkyl group having 1 to 6 carbon atoms, a halogen atom, a hydroxyl group and a cyano group; Y 1 and Y 2 each independently represent an alkyl group having 1 to 6 carbon atoms; n represents an integer of 0 or 5; and A + represents an organic counterion.

  提供以下公式（1）所表示的酸发生剂：其中，X代表具有1至10个碳原子的烷基基团，-X1-O-X2-或从氮、硫和氟组成的杂原子中选择的一个；X1和X2各自独立地表示具有1至10个碳原子的烷基基团；Y表示含有5至30个碳原子并含有一个或多个芳香环的环状烃基团，环状烃基团的环上一个或多个氢原子可以被选择自-O-Y1、-CO-Y2、具有1至6个碳原子的烷基基团、具有1至6个碳原子的烷氧基团、具有1至4个碳原子的全氟烷基团、具有1至4个碳原子的全氟烷氧基团、具有1至6个碳原子的羟基烷基团、卤素原子、羟基团和氰基的一个或多个成员取代；Y1和Y2各自独立地表示具有1至6个碳原子的烷基基团；n表示0或5的整数；A+表示有机对离子。
• METHOD FOR PREPARING POLYARYLENE SULFIDE (PAS) MONOMER
  申请人：Industrial Technology Research Institute

  公开号：EP3190142A1

  公开（公告）日：2017-07-12

  A method for preparing a cationic sulfoxide intermediate having the following formula (1): wherein Ar1 and Ar2 are substituted or unsubstituted aryl groups that are the same or different, includes reacting hydrogen peroxide with (i) a compound having the following formula (2) or sulfonic acid R'SO3H, wherein R' is CH3, CF3, phenyl, toluene, or OH, and (ii) a cationic thioether intermediate having the following formula (4) to obtain the cationic sulfoxide intermediate: wherein R is a substituted or unsubstituted C1-C6 alkyl group; and wherein Ar1 and Ar2 are as defined above and Y is an anion.

  一种具有下式(1)的阳离子亚砜中间体的制备方法： 其中 Ar1 和 Ar2 是相同或不同的取代或未取代的芳基，包括将过氧化氢与(i) 下式（2）的化合物或磺酸 R'SO3H（其中 R'是 CH3、CF3、苯基、甲苯或 OH）和(ii) 下式（4）的阳离子硫醚中间体反应，得到阳离子亚砜中间体： 其中 R 是取代或未取代的 C1-C6 烷基；以及 其中 Ar1 和 Ar2 如上定义，Y 为阴离子。