S-3-oxobutyl benzothioate | 91142-72-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: S-3-oxobutyl benzothioate
• 英文别名: S-Benzoyl-4-mercapto-butan-2-on；S-(3-oxobutyl) benzenecarbothioate
• CAS: 91142-72-2
• 化学式: C₁₁H₁₂O₂S
• 分子量: 208.281
• InChiKey: SOYWFBXCRGMERV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2
• 重原子数：
  14
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.27
• 拓扑面积：
  59.4
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  4-甲基-2-苯基-5,6-二氢-1,3-噻嗪-4-醇 在 盐酸 作用下， 生成 S-3-oxobutyl benzothioate
  参考文献：
  名称：

  154.与头孢菌素C有关的研究。第二部分。合成5,6-dihydro-4 H -1,3-噻嗪和3,6-dihydro-2 H -1,3-噻嗪的合成途径

  摘要：

  DOI：

  10.1039/jr9640000788

文献信息

• One-pot odourless synthesis of thioesters via in situ generation of thiobenzoic acids using benzoic anhydrides and thiourea
  作者：Mohammad Abbasi、Reza Khalifeh

  DOI：10.3762/bjoc.11.141

  日期：——

  efficient and odourless procedure for a one-pot synthesis of thioesters by the reaction of benzoic anhydrides, thiourea and various organic halides (primary, allylic, and benzylic) or structurally diverse, electron-deficient alkenes (ketones, esters, and nitriles) in the presence of Et3N has been developed. In this method, thiobenzoic acids were in situ generated from the reaction of thiourea with benzoic anhydrides

  一种高效、无味的方法，通过苯甲酸酐、硫脲和各种有机卤化物（伯卤化物、烯丙基卤化物和苄基卤化物）或结构多样的缺电子烯烃（酮、酯和腈）的反应来一锅合成硫酯。 Et3N 的存在已被开发出来。在该方法中，硫脲与苯甲酸酐反应原位生成硫代苯甲酸，苯甲酸酐与缺电子烯烃进行共轭加成或与卤代烷发生亲核置换反应。
• Synthesis of S-functionalized thioesters using thioaroylate ions derived from carboxylic acids and tetrathiomolybdate via acyloxyphosphonium intermediates
  作者：Purushothaman Gopinath、Chanda Debasree、Ravindran Sasitha Vidyarini、Srinivasan Chandrasekaran

  DOI：10.1016/j.tet.2010.06.028

  日期：2010.8

  Thioaroylate ions generated in situ from acyloxyphosphonium salts and tetrathiomolybdate upon Michael addition or ring opening of three membered systems led to a facile synthesis of S-functionalized thioesters. While the ring opening of aziridines gave very good yield of the products, Michael addition and epoxide ring opening gave moderate yields.

  在三元体系的迈克尔加成或开环后，由酰氧基phosph盐和四硫代钼酸盐原位产生的硫代芳族酸酯离子导致了S-官能化硫酯的简便合成。尽管氮丙啶的开环给出了非常好的产物收率，但是迈克尔加成和环氧化物的开环给出了中等收率。
• RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER
  申请人：Momose Hikaru

  公开号：US20090198065A1

  公开（公告）日：2009-08-06

  To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like. In formulas (1) and (2), n represents an integer of 2 to 24; J represents a single bond or a divalent hydrocarbon group which may have a substituent/heteroatom when n=2, or represents an n-valent hydrocarbon group which may have a substituent/heteroatom when n≧3; E represents a residue of a polymerization terminator, a chain transfer agent or a polymerization initiator; K 1 and K 2 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene, arylene, a divalent thiazoline ring, a divalent oxazoline ring and a divalent imidazoline ring; L 1 and L 2 each represent at least one selected from —C(O)O—, —C(O)— and —OC(O)—; M 1 , M 2 and M 3 each represent at least one selected from alkylene, cycloalkylene, oxyalkylene and arylene; Y, Y 1 and Y 2 each represent an acid-decomposable linkage; k1, k2, l1, l2, m1, m2, and m3 each represent 0 or 1; and R 1 represents H or a methyl group.

  提供一种抗蚀聚合物，其由一个具有结构式（1）或（2）所表示的酸分解单元作为结构单元，能够在DUV准分子激光微影或类似工艺中表现出小的线边粗糙度并产生少量缺陷。在式（1）和（2）中，n表示2至24的整数；J表示单键或二价碳氢基团，当n=2时可以具有取代基/杂原子，或者当n≥3时可以表示n价碳氢基团，可以具有取代基/杂原子；E表示聚合终止剂、链转移剂或聚合引发剂的残基；K1和K2分别表示至少选择自烷基、环烷基、氧烷基、芳烃、二价噻唑环、二价噁唑环和二价咪唑环中的至少一种；L1和L2分别表示至少选择自—C（O）O—、—C（O）—和—OC（O）—中的至少一种；M1、M2和M3分别表示至少选择自烷基、环烷基、氧烷基和芳烃中的至少一种；Y、Y1和Y2分别表示酸分解键；k1、k2、l1、L2、m1、m2和m3分别表示0或1；R1表示H或甲基基团。
• US8049042B2
  申请人：——

  公开号：US8049042B2

  公开（公告）日：2011-11-01